Publications by ALD CoE

ALD Reviews by ALD CoE


11. Recommended reading list of early publications on atomic layer deposition — Outcome of the "Virtual Project on the History of ALD"
Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali, Mikhael Bechelany, Maria Berdova, Stefan Boyadjiev, David C. Cameron, Rong Chen, Mikhail Chubarov, Veronique Cremers, Anjana Devi, Viktor Drozd, Liliya Elnikova, Gloria Gottardi, Kestutis Grigoras, Dennis M. Hausmann, Cheol Seong Hwang, Shih-Hui Jen, Tanja Kallio, Jaana Kanervo, Ivan Khmelnitskiy, Do Han Kim, Lev Klibanov, Yury Koshtyal, A. Outi I. Krause, Jakob Kuhs, Irina Kärkkänen, Marja-Leena Kääriäinen, Tommi Kääriäinen, Luca Lamagna, Adam A. Lapicki, Markku Leskelä, Harri Lipsanen, Jussi Lyytinen, Anatoly Malkov, Anatoly Malygin, Abdelkader Mennad, Christian Militzer, Jyrki Molarius, Malgorzata Norek, Çagla Özgit-Akgün, Mikhail Panov, Henrik Pedersen, Fabien Piallat, Georgi Popov, Riikka L. Puurunen, Geert Rampelberg, Robin H. A. Ras, Erwan Rauwel, Fred Roozeboom, Timo Sajavaara, Hossein Salami, Hele Savin, Nathanaelle Schneider, Thomas E. Seidel, Jonas Sundqvist, Dmitry B. Suyatin, Tobias Törndahl, J. Ruud van Ommen, Claudia Wiemer, Oili M. E. Ylivaara, Oksana Yurkevich, Journal of Vacuum Science and Technology A 35 (2017) 010801 (13 pages), open access.
http://dx.doi.org/10.1116/1.4971389


10. Thin films on silicon: ALD
R. L. Puurunen, M. Putkonen 2015 In book : Handbook of Silicon Based MEMS Materials and Technologies, edited by Markku Tilli, Teruaki Motooka, Veli-Matti Airaksinen, Sami Franssila, Mervi Paulasto-Krockel, Veikko Lindroos, Elsevier. Print Book ISBN: 9780323299657 eBook ISBN: 9780323312233.
http://dx.doi.org/10.1016/B978-0-323-29965-7.00006-3


9. A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy
R. L. Puurunen 2014 In : Chem. Vapor Deposition, 20, p. 332-344.
http://dx.doi.org/10.1002/cvde.201402012
This publication is Open Access and can be downloaded directly here:
http://www.aldcoe.fi/publications/ald_history.pdf


8. Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Films: Focus on Heteroleptic Precursors
Timothee Blanquart, Jaakko Niinistö, Mikko Ritala, and Markku Leskelä 2014 In : Chem. Vap. Deposition, 20, 189-208.
http://dx.doi.org/10.1002/cvde.201400055


7. Atomic Layer Deposition of Noble Metals and Their Oxides
Hämäläinen, J., Ritala, M. & Leskelä, M. 2014 In : Chemistry of Materials. 26, 1, p. 786-801. 16p.
http://dx.doi.org/10.1021/cm402221y
This article is part of the Celebrating Twenty-Five Years of Chemistry of Materials special issue.


6. PCRAM
Simone Raoux and Mikko Ritala 2014 In: Atomic Layer Deposition for Semiconductors, Ed. C. S. Hwang, Springer, p. 123.
http://dx.doi.org/10.1007/978-1-4614-8054-9_5


5. History of Atomic Layer Deposition and its Relationship with the American Vacuum Society
Gregory N. Parsons, Jeffrey W. Elam, Steven M. George, Suvi Haukka, Hyeongtag Jeon, W. M. M. (Erwin) Kessels, Markku Leskelä, Paul Poodt, Mikko Ritala and Steven M. Rossnagel 2103 in: Journal of Vacuum Science and Technology A, 31, 050818.
http://dx.doi.org/10.1116/1.4816548


4. Precursors as enablers of ALD technology: Contributions from University of Helsinki
Hatanpää, T., Ritala, M. & Leskelä, M. 2013 In : Coordination Chemistry Reviews. 257, 23-24, p. 3297–3322. 26 p.
http://dx.doi.org/10.1016/j.ccr.2013.07.002


3. In Situ Studies on Reaction Mechanisms in Atomic Layer Deposition
Knapas, K. & Ritala, M. 2013 In : Critical Reviews in Solid State and Materials Sciences. 38, 3, p. 167-202. 36 p.
http://dx.doi.org/10.1080/10408436.2012.693460


2. Crystallinity of inorganic films grown by atomic layer deposition: overview and general trends
Miikkulainen, V., Leskelä, M., Ritala, M. & Puurunen, R. L. 2013 In : Journal of Applied Physics (Applied Physics Reviews). 113, 021301. 101 p.
http://dx.doi.org/10.1063/1.4757907


1. Double metal alkoxides of lithium: Synthesis, structure and applications in materials chemistry
Mäntymäki, M., Ritala, M. & Leskelä, M. 2012 In : Coordination Chemistry Reviews. 256, 9-10, p. 854-877. 24 p.
http://dx.doi.org/10.1016/j.ccr.2011.11.015