Publications by ALD CoE

Presentations by ALD CoE


201. Photo-assisted ALD: Process Development and Application Perspectives
V. Miikkulainen, K. Väyrynen, V. Kilpi, Z. Han, M. Vehkamäki, K. Mizohata, J. Räisänen, M. Ritala, 232nd ECS Meeting, National Harbor MD, USA, October 1-5th 2017, invited talk.


200. Introduction to atomic layer deposition
V. Miikkulainen, Atomic Layer Deposition: Fundamentals and Applications, HERALD workshop, Rijeka, Croatia, September 21-22th 2017, invited talk.


199. Atomic layer deposition for lithium ion batteries
V. Miikkulainen, Atomic Layer Deposition: Fundamentals and Applications, HERALD workshop, Rijeka, Croatia, September 21-22th 2017, invited talk.


198. New ALD Processes for Microelectronics
M. Ritala, T. Hatanpää, J. Hämäläinen, M. Mattinen, M. Mäkelä, K. Väyrynen. M. Leskelä, E-MRS Fall Meeting 2017, Warsaw, Poland, September 18-21th 2017, invited talk.


197. In situ High Temperature X-ray Scattering Studies on Atomic Layer Deposited Bilayers of A2CO3 and MO2 (A = Li/Na, M= Nb/Ti/Hf)
E. Atosuo, M.J. Heikkilä, V. Miikkulainen, M. Vehkamäki, M. Ritala, M. Leskelä, E-MRS Fall Meeting 2017, Warsaw, Poland, September 18-21th 2017, talk.


196. ALD of Functional Transition Metal Oxides
M. Leskelä, T. Hatanpää, M.J. Heikkilä, J. Hämäläinen, T. Iivonen, K. Kukli, K. Väyrynen, M. Ritala, E-MRS Fall Meeting 2017, Warsaw, Poland, September 18-21th 2017, invited talk.


195. Conductive, Epitaxial LaNiO3 by Atomic Layer Deposition
P.J. King, M.J. Heikkilä, M. Vehkamäki, K. Mizohata, M. Ritala, M. Leskelä, E-MRS Fall Meeting 2017, Warsaw, Poland, September 18-21th 2017, talk.


194. Investigation of Instabilities in Oxide-Nitride-Alumina Memory Capacitors
N. Nikolaou, P. Dimitrakis, P. Normand, K. Giannakopoulos, M. Barozzi, G. Pepponi, K. Kukli, M. Ritala, M. Leskelä, V. Ioannou-Sougleridis, EUROMAT 2017 Conference, Thessaloniki, Greece, September 17-22th 2017, poster.


193. Electrical Performance of Atomic Layer Deposited Alumina Films Using Different Oxidants
N. Nikolaou, P. Dimitrakis, P. Normand, A. Zeniou, K. Kukli, M. Ritala, M. Leskelä, V. Ioannou-Sougleridis, EUROMAT 2017 Conference, Thessaloniki, Greece, September 17-22th 2017, poster.


192. Atomic Layer Deposited Materials for Energy Applications
M. Leskelä, M. Ritala, 4th International Conference on Nanotechnology, Nanomaterials & Thin Films - NANOENERGY 2017, Espoo, Finland, July 26-28th 2017, invited talk.


191. Thermal ALD of Gold Thin Films
M. Mäkelä, T. Hatanpää, K. Mizohata, J. Räisänen, M. Leskelä, M. Ritala, 17th International Conference on Atomic Layer Deposition, Denver CO, USA, July 15-18th 2017, talk.


190. Improving Processability of Poorly Flowing Pharmaceutical Powders by Atomic Layer Deposition
T. Kääriäinen, M. Kemell, M.-L. Kääriäinen, A. Correia, H. Santos, J. Hirvonen, S.M. George, M. Ritala, M. Leskelä, 17th International Conference on Atomic Layer Deposition, Denver CO, USA, July 15-18th 2017, talk.


189. Atomic Layer Deposition for Rhenium Based Materials
J. Hämäläinen, M. Mattinen, M. Vehkamäki, K. Mizohata, K. Meinander, J. Räisänen, M. Ritala, M. Leskelä, 17th International Conference on Atomic Layer Deposition, Denver CO, USA, July 15-18th 2017, talk.


188. Tertiary Butyl Hydrazine as a Reducing Agent for Low-temperature Atomic Layer Deposition of Low-resisitivity Copper Thin Films
K. Väyrynen, K. Mizohata, J. Räisänen, D. Peeters, A. Devi, M. Ritala, M. Leskelä, 17th International Conference on Atomic Layer Deposition, Denver CO, USA, July 15-18th 2017, talk.


187. Atomic Layer Deposition of Cobalt(II) Oxide/Hydoxide Thin Films
T. Iivonen, E. Tirkkonen, K. Mizohata, K. Meinander, M. Leskelä, 17th International Conference on Atomic Layer Deposition, Denver CO, USA, July 15-18th 2017, talk.


186. Rhenium Thin Films by Atomic Layer Deposition
J. Hämäläinen, K. Mizohata, K. Meinander, M. Mattinen, M. Vehkamäki, J. Räisänen, M. Ritala, M. Leskelä, I. Kundrata, K. Fröhlich, Joint EuroCVD 21 – Baltic ALD 15, Linköping, Sweden, June 11th-14th 2017, poster.


185. Behavior of Mixed Ta2O5 and ZrO2 Films
K. Kukli, M. Kemell, M. Heikkilä, M. Vehkamäki, K. Mizohata, K. Kalam, M. Ritala, M. Leskelä, I. Kundrata, K. Fröhlich, Joint EuroCVD 21 – Baltic ALD 15, Linköping, Sweden, June 11th-14th 2017, talk.


184. The Production of Titania-Silver nanocomposites as a Biomedical Material
P. Piszczek, A. Radtke, M. Mäkelä, M. Leskelä, Joint EuroCVD 21 – Baltic ALD 15, Linköping, Sweden, June 11th-14th 2017, talk.


183. Selective Area Atomic Layer Deposition Using Parafilm as Mask
C. Zhang, J. Kalliomäki, M. Ritala, M. Leskelä, Joint EuroCVD 21 – Baltic ALD 15, Linköping, Sweden, June 11th-14th 2017, poster.


182. Studies on ALD of lithium-containing materials at the University of Helsinki
M. Mäntymäki, M. Ritala, and M. Leskelä, Joint EuroCVD 21 – Baltic ALD 15, Linköping, Sweden, June 11th-14th 2017, poster.


181. Photo-assisted ALD of Oxides and Metals
V. Miikkulainen, K. Väyrynen, V. Kilpi, K. Mizohata, J. Räisänen, M. Ritala, Joint EuroCVD 21 – Baltic ALD 15, Linköping, Sweden, June 11th-14th 2017, invited talk.


180. ALD process development and material characterization for various applications
V. Miikkulainen, Joint EuroCVD 21 – Baltic ALD 15, Linköping, Sweden, June 11th-14th 2017, poster.


179. Gas-phase lithiation of ALD manganese oxide for LixMn2O4
V. Miikkulainen, H. Nieminen, L. Simonelli, D. Settipani, A.-P. Honkanen, S. Huotari, P. Hönicke, C. Zech, K. Mizohata, M. Ritala, Joint EuroCVD 21 – Baltic ALD 15, Linköping, Sweden, June 11th-14th 2017, talk.


178. Titania Nanotubes Enriched with Nanocrystalline Hydroxyapatite as Composite Materials for Potential Medical Applications
A. Radtke, P. Piszczek, M. Kolodziejczak, T. Jedrzejewski, J. Holopainen, M. Ritala, M. Leskelä, Joint EuroCVD 21 – Baltic ALD 15, Linköping, Sweden, June 11th-14th 2017, poster.


177. Atomic Layer Deposition of Rhenium Disulfide
J. Hämäläinen, M. Mattinen, M. Vehkamäki, K. Mizohata, K. Meinander, J. Räisänen, M. Ritala, M. Leskelä, Graphene 2017, Barcelona, Spain, March 27-31th 2017, poster.


176. Low-temperature Atomic Layer Deposition of Crystalline MoS2
M. Mattinen, T. Hatanpää, T. Sarnet, K. Mizohata, K. meinander, P.J. King, L. Khriachtchev, J. Räisänen, M. Ritala, M. Leskelä, Graphene 2017, Barcelona, Spain, March 27-31th 2017, poster.


175. Residual stress in SiO2 thin films on silicon
O. Ylivaara, M. Putkonen, K. Pfeiffer, A. Szeghalmi, R. Puurunen, Stress Evolution in Thin Films and Coatings: from Fundamental Understanding to Control, Joint ICMCTF-SVC Workshop, Chicago, Illinois, USA, October 2-5th 2016, talk.


174. Behavior of mixed Ta2O5 and ZrO2 films
K. Kukli, M. Kemell, M. Heikkilä, M. Vehkämäki, K. Mizohata, M. Ritala, M. Leskelä, P. Jancovic, P. Galik, K. Frohlich, 14th International Baltic Conference on Atomic Layer Deposition, St. Petersburg, Russia, October 2-4th 2016, talk.


173. Atomic Layer Deposition of metal carbides - the TiCl4/TMA process as an example
M. Kaipio, M. Vehkämäki, M. Kemell, K. Mizohata, M. Ritala, M. Leskelä, 14th International Baltic Conference on Atomic Layer Deposition, St. Petersburg, Russia, October 2-4th 2016, talk.


172. Atomic Layer Deposition of Cobalt(II) Oxide Thin Films from a Silylamide Precursor
T. Iivonen, J. Kim, A. Devi, M. Leskelä, 14th International Baltic Conference on Atomic Layer Deposition, St. Petersburg, Russia, October 2-4th 2016, talk.


171. On the history of ALD and the VPHA project
R. L. Puurunen, Y. Koshtyal, H. Pedersen, J. R. van Ommen, O. Yurkevich, J. Sundqvist, 14th International Baltic Conference on Atomic Layer Deposition, St. Petersburg, Russia, October 2-4th 2016, invited talk.


170. Challenges, Opportunities and New Approaches in ALD Process Development
M. Ritala, 14th International Baltic Conference on Atomic Layer Deposition, St. Petersburg, Russia, October 2-4th 2016, invited talk.


169. Influence of ALD temperature on thin film conformality: investigation with microscopic lateral high-aspect-ratio structures
R. L. Puurunen, F. Gao, 14th International Baltic Conference on Atomic Layer Deposition, St. Petersburg, Russia, October 2-4th 2016, talk.


168. Atomic layer deposition of crystalline molybdenum oxide thin films
M. Mattinen, B. Fleming, S. Rushworth, P. King, L. Khriachtchev, M. Ritala, M. Leskelä, 14th International Baltic Conference on Atomic Layer Deposition, St. Petersburg, Russia, October 2-4th 2016, talk.


167. Copper(I) iodide thin films by atomic layer deposition and vapour conversion
G. Popov, S. Kettunen, T. Iivonen, M. Mattinen, M. L. Kemell, M. Ritala and M. Leskelä, 14th International Baltic Conference on Atomic Layer Deposition, St. Petersburg, Russia, October 2-4th 2016, talk.


166. Ferromagnetic Domain Walls in ALD Grown Bismuth Ferrite
P. Jalkanen, B. Marchand, V. Tuboltsev, M. Vehkamäki, K. Mizohata, M. Kemell, T. Hatanpää, M. Puttaswamy, M. Leskelä, M. Ritala, J. Räisänen, The 4th Annual ALD Seminar, May 23-24th 2016, poster.


165. Proton-induced gamma-ray production cross sections and thick target yields for boron, nitrogen and silicon
K. Mizohata, B. Marchand, J. Räisänen, ECAART12 Conference, Jyväskylä, Finland, July 3-8th 2016, poster.


164. X-ray production cross sections induced by 14-55 MeV 35Cl, 79Br and 127I ions for selected elements
K. Mizohata, T. Nissinen, V. Miikkulainen, M. Mäkelä, J. Räisänen, ECAART12 Conference, Jyväskylä, Finland, July 3-8th 2016, poster.


163. Elastic Recoil Detection Analysis of Thin Films
P. Jalkanen, K. Mizohata, M. Mattinen, M. Ritala, J. Räisänen, ECAART12 Conference, Jyväskylä, Finland, July 3-8th 2016, poster.


162. Manufacturing of hydroxyapatite nanocoatings and nanofibers
J. Holopainen, 2nd Bone and Biomaterials workshop, Inari, Finland, August 7-9th 2016, talk.


161. TiO2 Nanotube and Nanowire Coatings Enriched with Tailored ALD Silver Nanoclusters – as Biocompatible Surfaces of Modern Surgical Implants
A. Radtke, P. Piszczek, A. Topolski, M. Mäkelä, M. Heikkilä, M. Leskelä, T. Jedrzejewski, W. Kozak, B. Sadowska, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, talk.


160. Atomic Layer Deposition on Solid Pharmaceutical Powders
T. Kääriäinen, M. Kemell, M.-L. Kääriäinen, A. Correia, H. Santos, J. Hirvonen, S.M. George, M. Ritala, M. Leskelä, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, talk.


159. Atomic layer deposition of molybdenum disulfide from Mo(thd)3 and H2S
M. Mattinen, T. Sarnet, T. Hatanpää, M. Ritala, M. Leskelä, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, talk.


157. On the atomic layer deposition of control oxide layers for flash memory devices
K. Kukli, K. Mizohata, M. Ritala, M. Leskelä, N. Nikolaou, P. Dimitrakis, P. Normand, D. Skarlatos, K. Giannakopoulos, K. Mergia, V. Ioannou-Sougleridis, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, poster.


156. Atomic layer deposition of oxides exhibiting resistive switching characteristics
K. Kukli, M. Ritala, M. Leskelä, T. Arroval, A. Tamm, J. Aarik, H. García, S. Dueñas, H. Castán, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, talk.


155. Effect of precursor chemistry on residual stress of ALD Al2O3 and TiO2 films
V. Miikkulainen, H. Nieminen, O. Ylivaara, K. Mizohata, R. Puurunen and M. Ritala, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, poster.


154. Evaluation of the TiCl4/TMA process for depositing conformal TiCx copper diffusion barriers
M. Kaipio, M. Vehkamäki, M. Kemell, K. Mizohata, M. Ritala ja M. Leskelä, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, poster.


153. Lithium Containing Transition Metal Oxides by Solid State Reaction of Atomic Layer Deposited Thin Films
E. Atosuo, M. Mäntymäki*, M. J. Heikkilä, K. Mizohata, M. Ritala, and M. Leskelä, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, talk.


152. Highly conformal TiN by atomic layer deposition: growth and characterization
K. Grigoras, O. M. E. Ylivaara*, F. Gao, M. J. Heikkilä, K. Mizohata, M. Prunnila, J. Räisänen, M. Ritala, M. Leskelä, J. Ahopelto, R. L. Puurunen, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, poster.


151. Comparison of interpretations on the surface chemistry of the trimethylaluminium-water ALD process
R. L. Puurunen, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, talk.


150. Study of processing parameters on the mechanical and compositional properties of plasma-enhanced atomic layer deposition aluminum nitride films
A. P. Perros, O. Ylivaara, X. Liu, J. Julin, T. Sajavaara, S. Ali, S. Sintonen, H. Lipsanen and R. L. Puurunen*, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, talk.


149. On the early history of atomic layer deposition: most significant works and applications
Aarik et al. with 51 co-authors (full abstract with list of authors), ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, poster.


148. Residual stress in thin films made by atomic layer deposition
O. M. E. Ylivaara, R. L. Puurunen, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, talk.


147. Studies of thermal atomic layer deposition of gold and silver
M. Mäkelä, T. Hatanpää, J. Niinistö, K. Mizohata, M. Ritala and M. Leskelä, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, poster.


146. Atomic layer deposition of tin oxide thin films using bis[bis(trimethylsilyl)amino]tin(II) and water or ozone
J. Tupala, M. Kemell, M. Mattinen, K. Meinander, S. Seppälä, T. Hatanpää, J. Räisänen, M. Ritala and M. Leskelä, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, talk.


145. Thermal Low-Temperature Deposition of Platinum Nanoparticles on Carbon Nanotubes
U. Helmstedt, J. Hämäläinen, O. Naumov, A. Prager, A. Varga, M. Leskelä and B. Abel, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, poster.


144. CuOx - TiO2 Composite Thin Films in Environmental Photocatalysis
T. Iivonen, J. Hämäläinen, M. Leskelä, M. Buchalska, M. Surowka, W. Macyk, ALD 2016 (16th International Conference on Atomic Layer Deposition), Dublin, Ireland, July 24th-27th 2016, poster.


143. Straightforward Conversion of MnO2 to LixMn2O4 by gas-solid reactions
V. Miikkulainen, M.J. Heikkilä, P. John, M. Ritala, M. Leskelä, Synchrotron Radiation to study Atomic Layer Deposition HERALD workshop, Barcelona, June 12-15th 2016, talk.


142. In situ High Temperature X-Ray Scattering Studies of some Atomic Layer Deposited Layers of Metals and Metal Oxides
M. J. Heikkilä, K. Kukli, E. Atosuo, O. Ylivaara, R.L. Puurunen, M. Ritala, M. Leskelä, Synchrotron Radiation to study Atomic Layer Deposition HERALD workshop, Barcelona, June 12-15th 2016, talk.


141. Atomic Layer Deposited Protective Layers
M. Leskelä, E. Salmi, M. Ritala, THERMEC 2016, International Conference on Processing & Manufacturing of Advanced Materials, Graz, Austria 2016, talk, Book of Abstracts, p. 337.


140. High-k thin films in 3-D structures: metrology with microscopic lateral high-aspect-ratio structures
Riikka Puurunen, Novel High-k Application Workshop, NamLab, Dresden Germany, March 14-15. talk.


139. Atomic Layer Deposition of Dichalcogenides
Markku Leskelä, Beyond CMOS workshop, IMEC, Belgium, October 15th 2015, invited talk.


138. Platform for Label-Free Biosensing: Graphene BioFET
J. Ahopelto, University of Santiago, Chile, 7.12.2015, Invited.


137. Platform for Label-Free Biosensing
Sanna Arpiainen, Miika Soikkeli, Katri Kurppa, Markku Kainlauri, David Gunnarsson, Jussi J. Joensuu, Mika Prunnila, and Jouni Ahopelto, 22nd Latin American Symposium on Solid State Physics SLAFES2015, Pto Varas, Chile, 1.-4.12. 2015, Invited.


136. Nanostructured Photocatalysts made By Atomic Layer Deposition
Markku Leskelä, EU-ASEAN Symposium and workshop on Photocatalysis, Johor Bahru, Malaysia, Nov. 24, 2015, keynote presentation.


135. State-of-art ALD, trends and applications
Riikka Puurunen, Flexible Electronics (Gibkaya Elektronika 15), Russian conference with international participation, St Petersburg Electrotechnical University, Nov. 12, 2015, invited lecture.


134. Heteroleptic cyclopentadienylamidinate complexes as precursors for ALD of rare earth oxide thin films
Sanni Seppälä, Timothee Blanquart, Jaakko Niinistö, Mikko Ritala, Markku Leskelä, Clement Lansalot-Matras, Wontae Noh, 9th international conference on f-elements 2015, 6-9 September 2015, Oxford, UK, poster.


133. Porous silicon based on-chip supercapacitors
K. Grigoras, J. Keskinen, L. Grönberg, J. Ahopelto, and M. Prunnila, Smart Systems Integration (International Conference and Exhibition on Integration Issues of Miniaturized Systems), 11-12 March 2015, Copenhagen, Denmark.
http://www.smart-systems-integration.org/public/news-events/events/ssi-2015-international-conference-and-exhibition-on-integration-issues-of-miniaturized-smart-systems/


132. Atomic layer deposition for on-chip supercapacitors
K. Grigoras, J. Keskinen, L. Grönberg, J. Ahopelto, and M. Prunnila, AFM-2015 (Advances in Functional Materials), 29 June – 3 July 2015, Stony Brook, New York, USA.
http://afm2015.functionalmaterials.org/


131. 3D Silicon Structure Preparation by Focused Ion Beam Patterning through Metal Oxide Hard Masks with Subsequent Use of Wet Etching and Thermal Annealing for Beam Damage recovery
Marko Vehkamäki, Zhongmei Han, Markku Leskelä, Mikko Ritala, MNE 2015, 21-24 September 2015, The Hague, The Netherlands, talk.


130. How conformal is conformal? Exploring the limits of ALD film conformality with VTT's lateral microscopic PillarHall test structure
R. L. Puurunen, ALD Russia, 21-23 September 2015, Dolgoprudny, Russia, invited talk.


129. Virtual Project on the History of ALD: overview and current status
Riikka L. Puurunen, Yury Koshtyal, Henrik Pedersen, Ruud J. van Ommen, Jonas Sundqvist, ALD Russia, 21-23 September 2015, Dolgoprudny, Russia, talk.


128. Lithiation of binary oxides using atomic layer deposition and solid state reaction
Elisa Atosuo, Miia Mäntymäki, Mikko J. Heikkilä, Kenichiro Mizohata, Mikko Ritala, Markku Leskelä, BALD 2015, September 28-29 2015, Tartu, Estonia, talk.


127. Ir(acac)3+O2+H2 process for atomic layer deposition of iridium films and its comparison with Ir(acac)3+O2 process
Miika Mattinen, Jani Hämäläinen, Pasi Jalkanen, Kenichiro Mizohata, Mikko Ritala, Markku Leskelä, BALD 2015, September 28-29 2015, Tartu, Estonia, poster.


126. Photo-ALD of tantalum and niobium oxides
Katja Väyrynen, Ville Miikkulainen, Kenichiro Mizohata, Väinö Kilpi, Mikko Ritala, BALD 2015, September 28-29 2015, Tartu, Estonia, talk.


125. Tailored ALD silver nanoclusters coating of TiO2 nanotubes (TNT) and nanowires (TNW)
A. Radtke, P. Piszczek, A. Topolski, M. Mäkelä, M. Heikkilä, M. Leskelä, BALD 2015, September 28-29 2015, Tartu, Estonia, poster.


124. Virtual Project on the History of ALD: overview and current status
Riikka L. Puurunen, Yury Koshtyal, Henrik Pedersen, Ruud J. van Ommen, Jonas Sundqvist, BALD 2015, September 28-29 2015, Tartu, Estonia, poster.


123. Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes
Hannele Heikkinen, Oili Ylivaara, Leif Grönberg, Riikka Puurunen, BALD 2015, September 28-29 2015, Tartu, Estonia, poster.


122. Recent Challenges in ALD
Markku Leskelä, BALD 2015, September 28-29 2015, Tartu, Estonia, invited talk.


121. Atomic layer deposition of As2S3 thin films
Marianna Kemell, Elina Färm, Mikko Heikkilä, Marko Vehkamäki, Mikko Ritala, Markku Leskelä, BALD 2015, September 28-29 2015, Tartu, Estonia, talk.


120. Mechanical property mapping of ALD thin films
Riikka L. Puurunen, Saima Ali, Kai Arstila, Maria Berdova, Eero Haimi, Hannele Heikkinen, Jaakko Julin, Lauri Kilpi, Mikko Laitinen, Xuwen Liu, Jussi Lyytinen, Jari Malm, Alexander Pyymaki Perros, Ville Rontu, Sakari Sintonen, Oili Ylivaara, Timo Sajavaara, Harri Lipsanen, Sami Franssila, Jari Koskinen, Helena Ronkainen, Simo-Pekka Hannula, Jyrki Kiihamäki, BALD 2015, September 28-29 2015, Tartu, Estonia, talk.


119. Plasma-enhanced atomic layer deposition of titanium nitride thin film bias resistors for silicon pixel detectors
Jennifer Ott, Maarit Mäkelä, Jaakko Härkönen, Jaakko Niinistö, Kenichiro Mizohata, Esa Tuovinen, Akiko Gädda, Mikko Ritala, BALD 2015, September 28-29 2015, Tartu, Estonia, poster.


118. Effect of oxygen source on film properties in ALD of lanthanum oxide
Sanni Seppälä, Jaakko Niinistö, Kenichiro Mizohata, Clement Lansalot-Matras, Wontae Noh, Mikko Ritala, Markku Leskelä, BALD 2015, September 28-29 2015, Tartu, Estonia, talk.


117. ALD of MoS2 from a new precursor
Tiina Sarnet, Timo Hatanpää, Miika Mattinen, Leonid Khriachtchev, Mikko Ritala, Markku Leskelä, BALD 2015, September 28-29 2015, Tartu, Estonia, poster.


116. Fluorides as active materials in lithium-ion batteries
M. Mäntymäki, Workshop - ALD for Batteries, Ghent, Belgium, 15.09.2015-16.09.2015, oral presentation.


115. Atomic Layer Deposition of Zinc Glutarate Thin Films
L. D. Salmi, T. Niemi, M. Ritala, 4th International Symposium on Energy Challenges and Mechanics (ECM4) - working on small scales, Aberdeen, United Kingdom, 11.08.2015-13.08.2015, oral presentation.


114. Atomic Layer Deposition for Lithium-ion Battery Development
M. Mäntymäki, 4th International Symposium on Energy Challenges and Mechanics (ECM4) - working on small scales, Aberdeen, United Kingdom, 11.08.2015-13.08.2015, oral presentation.


113. ALD Process Development: Solutions to Industrial Challenges
Markku Leskelä, Tutorial at ALD 2015, Portland, June 28- July 1.


112. Photo-assisted ALD of Oxides Employing Alkoxides as Single-source Precursors
V. Miikkulainen, K. Väyrynen, V. Kilpi, M. Ritala, Oral presentation at ALD 2015, Portland, June 28- July 1.


111. Challenges, Opportunities and New Approaches in ALD Process Development
M. Ritala, Invited talk at ALD 2015, Portland, June 28- July 1.


110. Comparison of Oxygen Sources in ALD of Lanthanum Oxide
S. Seppälä, J. Niinistö, K. Mizohata, C. Lansalot-Matras, W. Noh, M. Ritala, M. Leskelä, Oral presentation at ALD 2015, Portland, June 28- July 1.


109. Thermal and Plasma Enhanced Atomic Layer Deposition of Copper with an N-heterocyclic Carbene-stabilized Au(I) Amide
S.E. Koponen, M. Ritala, M. Leskelä, D.J. Hagen, I.M. Povey, M.E. Pemble, S. Barry, Poster presentation at ALD 2015, Portland, June 28- July 1.


108. Surface chemistry of atomic layer deposition: mechanisms and conformality
Riikka L. Puurunen, 98th Canadian Chemistry Conference, Ottawa, Canada, June 13-17, 2015, invited talk.


107. Atomic Layer Deposition – From Fundamentals to Applications
M. Ritala, ESTC 2014, 5th Electronics System-Integration Technology Conference, Helsinki, Finland, 16.09.2014-18.09.2014, instructor of a half-day professional development course.


106. In situ studies on reaction mechanisms in Atomic Layer Deposition processes
M. Ritala, 1st Belux workshop on Coating, Materials, Surfaces and Interfaces, Belvaux, Luxemburg, 11.09.2014-12.09.2014, invited talk.


105. Atomic layer deposition of titanium nitride layer on porous silicon supercapacitor electrodes
K. Grigoras, J. Keskinen, E. Yli-Rantala, S. Laakso, H. Välimäki, P. Kauranen, J. Ahopelto, M- Prunnila, ALD 2014 (14th International Conference on Atomic Layer Deposition), June 15-18, 2014, Kyoto, Japan, poster presentation. Abstracts, p. 301.


104. ALD coating of porous silicon
K. Grigoras, J. Keskinen, E. Yli-Rantala, S. Laakso, H. Välimäki, P. Kauranen, J. Ahopelto, M. Prunnila, 12th Baltic ALD Meeting, Helsinki, May 12-13, 2014, Oral presentation. Abstracts, p. 57.


103. Porous Si Electrodes for High Performance On-Chip Supercapacitors
K. Grigoras, J. Keskinen, J. Ahopelto, M. Prunnila, Electronic System-Integration Technology Conference ESTC-2014, Helsinki, September 16-18, 2014, oral presentation.


102. Coated Porous Si for for High Performance On-Chip Supercapacitors
M. Prunnila, K. Grigoras, J. Keskinen, L. Grönberg, J. Ahopelto, PowerMEMS2014, Hyogo, Japan, November 18-21, 2014, Oral presentation (by M.P.).


101. Atomic Layer Deposition of Titanium Dioxide Thin Films Photocatalysts
T. Iivonen, J. Hämäläinen, M. Buchalska, W. Macyk, M. Leskelä, The XXVth IUPAC Symposium on Photochemistry, July 13 - 18, 2014, Bordeaux, France.


100. CuInS2/CuI and CuInS2/CuSCN grown by SILAR in nanotubular TiO2 structures
J. Tupala, M. Kemell, S. Lindroos, M. Vehkamäki, M. Ritala, M. Leskelä, Nanoenergy-2014 (International conference on Nanotechnology, Nanomaterials & Thin Films for Energy Applications), London, Great Britain, 18.-21.2.2014, poster.


99. Nanotubes and Other Functional Nanomaterials by Atomic Layer Deposition
M. L. Kemell, M. Ritala, M. Leskelä, Nanoenergy-2014 (International conference on Nanotechnology, Nanomaterials & Thin Films for Energy Applications), London, Great Britain, 18.-21.2.2014, oral presentation (Abstract no. 162).


98. Thermoelectric properties of ALD Chalcogenides
Sarnet T., Hatanpää T., Puukilainen E., Mattinen, M., Vehkamäki, M., Flyktman, T., Ahopelto, J., Mizohata, K., Ritala M., Leskelä M., ALD2014: The 14th International Conference on Atomic Layer Deposition, June 15-18th, 2014, Kyoto, Japan, oral presentation.


97. Atomic Layer Deposition of AlF3 Using Halide Precursors
Mäntymäki, M., Ritala, M., Leskelä, M., ALD 2014 (14th International Conference on Atomic Layer Deposition), Kyoto, Japan, June 15th-18th, oral presentation.


96. Novel Heteroleptic ALD Precursors for Rare Earth Oxides
S. Seppälä, J. Niinistö, T. Blanquart, K. Mizohata, C. Lansalot, W. Noh, M. Ritala & M. Leskelä, 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan 2014, Abstracts, p. 42.


95. Oxide Composite Photocatalysts Made by ALD
M. Leskelä, J. Hämäläinen, T. Iivonen, J. Kim, R.A. Fischer, M. Buchalska & W. Macyk, 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan 2014, Abstracts, p. 83.


94. Preparation and Hydroxyapatite Thin Films by Conversion of Atomic Layer Deposited CaCO3
J. Holopainen, K. Kauppinen, K. Mizohata, E. Santala, M. Leskelä, J. Tuukkanen, & M. Ritala, 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan 2014, Abstracts, p. 137.


93. In situ Reaction Mechnism Studies on the Ho(thd)3, Ti(OiPr)4 and Ozone Processes
Y. Tomczak, K. Kukli, M. Kemell, M. Ritala & M. Leskelä, 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan 2014, Abstracts, p. 202.


92. Atomic Layer Deposition of TiO2 Thin Films Using Heteroleptic Titanium Precursors and Ozone
M. Kaipio, T. Blanquart, Y. Tomczak, J. Niinistö, M. Gavagnin, V. Longo, H.D. Wanzenboeck, V.R. Pallem, C. Dussarrt, E. Puukilainen, M. Ritala & M. Leskelä, 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan 2014, Abstracts, p. 230.


91. History of Atomic Layer Deposition
R. L. Puurunen, 14th International Conference on Atomic Layer Deposition (AVS ALD 2014), June 15-18, Kyoto, Japan. Invited tutorial.
Link to the Presentation


90. Si-based lateral high-aspect-ratio (LHAR) test structures for ALD growth conformality and uniformity evaluation
G. Feng, K. Grigoras, S. Arpiainen, S. Gorelick, R. L. Puurunen, ALD 2014 (14th International Conference on Atomic Layer Deposition), June 15-18, 2014, Kyoto, Japan, oral presentation (given by Puurunen).


89. On the Early History of ALD: Molecular Layering
J. Aarik, A. R. Akbashev, M. Bechelany, M. Berdova, D. Cameron, N. Chekurov, V. E. Drozd, S. D. Elliott, G. Gottardi, K. Grigoras, M. Junige, T. Kallio, J. Kanervo, Yu. Koshtyal, M.-L. Kääriäinen, T. Kääriäinen, L. Lamagna, A. Malkov, A. Malygin, J. Molarius, C. Ozgit-Akgun, H. Pedersen, R. L. Puurunen, A. Pyymäki Perros, R. H. A. Ras, F. Roozeboom, T. Sajavaara, H. Savin, T. E. Seidel, P. Sundberg, J. Sundqvist, M. Tallarida, J. R. van Ommen, T. Wächtler, C. Wiemer, O. M. E. Ylivaara, ALD 2014 (14th International Conference on Atomic Layer Deposition), June 15-18, 2014, Kyoto, Japan, poster presentation.


88. Overview of early publications on Atomic Layer Deposition
J. Aarik, A. R. Akbashev, M. Bechelany, M. Berdova, D. Cameron, N. Chekurov, V. E. Drozd, S. D. Elliott, G. Gottardi, K. Grigoras, M. Junige, T. Kallio, J. Kanervo, Yu. Koshtyal, M.-L. Kääriäinen, T. Kääriäinen, L. Lamagna, A. Malkov, A. Malygin, J. Molarius, C. Ozgit-Akgun, H. Pedersen, R. L. Puurunen, A. Pyymäki Perros, R. H. A. Ras, F. Roozeboom, T. Sajavaara, H. Savin, T. E. Seidel, P. Sundberg, J. Sundqvist, M. Tallarida, J. R. van Ommen, T. Wächtler, C. Wiemer, O. M. E. Ylivaara, ALD 2014 (14th International Conference on Atomic Layer Deposition), June 15-18, 2014, Kyoto, Japan, poster presentation.


87. Influence of post-ALD annealing and thermal cycling to the residual stress, elastic modulus and hardness of ALD Al2O3
Ylivaara, O.; Liu, X.; Sintonen, S.; Ali, S.; Julin, J.; Langner, A.; Haimi, E.; Sajavaara, T.; Lipsanen, H.; Hannula, S-P.; Puurunen, R., ALD 2014 (14th International Conference on Atomic Layer Deposition), June 15-18, 2014, Kyoto, Japan, poster presentation.


86. Titanium Nitride by Atomic Layer Deposition: Mechanical Properties
Riikka L. Puurunen, Oili M. E. Ylivaara, Xuwen Liu, Dieter Schneider, Jaakko Julin, Sakari Sintonen, Benoit Marchand, Pasi Jalkanen, Eero Haimi, Marko Tuominen, Markus Bosund, Jyrki Räisänen, Timo Sajavaara, Harri Lipsanen, Simo-Pekka Hannula, ALD 2014 (14th International Conference on Atomic Layer Deposition), June 15-18, 2014, Kyoto, Japan, poster presentation.


85. Studies on Atomic Layer Deposition of AlF3
Mäntymäki, M., Ritala, M., Leskelä, M., Baltic ALD 2014 (12th International Baltic ALD conference), Helsinki, Finland, May 12th-13th, oral presentation.


84. ALD and Characterization of Thermoelectric Chalcogenides
Sarnet T., Hatanpää T., Puukilainen E., Vehkamäki, M., Flyktman, T., Ahopelto, J., Mizohata, K., Ritala M., Leskelä M., BALD2014: The 12th International Baltic Conference on Atomic Layer Deposition, May 12-13th, 2014, Helsinki, Finland, oral presentation.


83. Studies on Atomic Layer Deposition of IRMOF-8
Salmi, L. D., Heikkilä, M. J., Vehkamäki, M., Ritala, M., Baltic ALD 2014 (12th International Baltic ALD conference), Helsinki, Finland, May 12th-13th, oral presentation.


82. Graphene on ZrO2 and Al2O3 Gate Dielectrics
S. Arpiainen, J. Niinistö, M. Soikkeli, M. Prunnila, M. Ritala, M. Leskelä & J. Ahopelto, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 129.


81. Patterning of ALD Oxide Fiulms by Focused Ion Beam Direct Writing
Z. Han, M. Vehkamäki, E. Härkönen, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 130.


80. Studies of Possible Germanium Precursors for ALD of GST and Related Materials
T. Hatanpää, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 133.


79. Cyclopentadienyl Precursors for ALD of Erbium Oxide Thin Films
T. Blanquart, M. Kaipio, J. Niinistö, M. Gavagnin, V. Longo, K. Mizohata, C. Lansalot, W. Noh, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 138.


78. Atomic Layer Deposition of Copper(II) Oxide Thin Films Using bis-(dimethylamino-2-propoxide)copper(II) and Ozone
T. Iivonen, J. Hämäläinen, J. Kim, R.A. Fischer & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 139.


77. HTXRD Study of SnCeO3 Grown by ALD Using Single Metal Source
M.J. Heikkilä, T.M. Leuning, J. Schläfer, J. Niinistä, S. Mathur, M. RItala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 141.


76. ALD Sulfide Semiconductor Films as Potential Photosensor Active Materials
M. Vehkamäki, Z. Han, S. Seppälä, E. Härkönen, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 149.


75. In situ Reaction Mechnism Studies on the Ho(thd)3, Ti(OiPr)4 and Ozone Processes
Y. Tomczak, K. Kukli, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 35.


74. Atomic Layer Deposition of Holmium Titanium Oxide Films
K. Kukli, M. Kemell, J. Lu, J. Link, M.C. Dimri, E. Puukilainen, R. Hoxha, A. Tamm, R. Stern, L. Hultman, M. Ritala, & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 51.


73. Atomic Layer Deposition of Bismuth Titanate (Bi4Ti3O12)
M. Puttaswamy, P. Jalkanen, M. Vehkamäki, T. Hatanpää, K. Kukli, M. Kemell, M. Heikkilä, B. Marchand, V. Tuboltsev, J. Räisänen, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 52.


72. Cu2O Films Grown by ALD Using Copper(II)acetate and Water
M.J. Heikkilä, A. Rahtu, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 53.


71. Magnetism in Multiferroic BiFeO3 Thin Films Synthesized by ALD
B. Marchand, V. Tuboltsev, A. Savin, P. Jalkanen, K. Mizohata, J. Räisänen, M. Puttaswamy, M. Vehkamäki, T. Hatanpää, M. Kemell, K. Kukli, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 56.


70. Characterization and Fusion Protein Monolyer Properties with Dual-gate Graphene FETs
M. Soikkeli, M. Kainlauri, K. Kurppa, J. Niinistö, S. Arpiainen, J.J. Joensuu, M. Prunnila, M. Ritala, M. Leskelä, M.B. Lindner & J. Ahopelto, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 59.


69. Conversion of Atomic Layer Deposited CaCO3 to Nanocrystalline Hydroxyapatite Thin Films
J. Holopainen, K. Kauppinen, K. Mizohata, E. Santala, M. Leskelä, J. Tuukkanen & M. Ritala, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 60.


68. Ferroelectric Properties of ALD Grown BiFeO3
P. Jalkanen, B. Marchand, V. Tuboltsev, J. Räisänen, M. Puttaswamy, M. Vehkamäki, T. Hatanpää, M. Kemell, K. Kukli, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 89.


67. Characterization of ALD Materials for Optical Applications in Ultraviolet Range
A. Langner, E. Färm, O.M.E. Ylivaara, M. Ritala, M. Leskelä & R.L: Puurunen, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 107.

66. Third-order Nonlinearity Measurements of Polyimide/Ta2O5 Nanolaminates Depositied by Atomic Layer Deposition
E. Färm, L. Karvonen, A. Säynätjoki, S. Mehravar, K. Kieu, M. Ritala, M. Leskelä & M. Kemell, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 111.


65. Novel Heteroleptic ALD Precursors for Gd2O3
S. Seppälä, J. Niinistö, K. Mizohata, C. Lansalot, W. Noh, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 120.


64. Atomic Layer Deposition of TiO2 Thin Films Using Heteroleptic Titanium Precursors and Ozone
M. Kaipio, T. Blanquart, Y. Tomczak, J. Niinistö, M. Gavagnin, V. Longo, H.D. Wanzenböck, V.R. Pallem, C. Dussarant, E. Puukilainen, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 125.


63. Heteroleptic Guanidinate Precursors for ALD of TiO2 and ZrO2
M. Kaipio, T. Blanquart, M. Banerjee, J. Niinistö, V. Longo, K. Mizohata, A. Devi, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 126.


62. Remote Plasma ALD Silver Nanoparticles on Graphene
S. Arpiainen, Y. Chen, M. Mäkelä, J. Niinistö, H. Lipsanen, J. Ahopleto, M. Ritala & M. Leskelä, 12th Baltic ALD Meeting, Helsinki 2014, Abstracts, p. 128.


61. Overview of early publications on Atomic Layer Deposition
J. Aarik, A. R. Akbashev, M. Bechelany, M. Berdova, D. Cameron, N. Chekurov, V. E. Drozd, S. D. Elliott, G. Gottardi, K. Grigoras, T. Kallio, J. Kanervo, Yu. Koshtyal, M.-L. Kääriäinen, T. Kääriäinen, L. Lamagna, A. Malkov, A. Malygin, C. Ozgit-Akgun, H. Pedersen, R. L. Puurunen, A. Pyymäki Perros, R. H. A. Ras, F. Roozeboom, T. Sajavaara, H. Savin, T. E. Seidel, P. Sundberg, J. Sundqvist, M. Tallarida, J. R. van Ommen, T. Wächtler, C. Wiemer, O. M. E. Ylivaara, Baltic ALD 2014 (12th International Baltic Conference on Atomic Layer Deposition), May 12-13, Helsinki, Finland, poster presentation.


60. Si-based lateral high-aspect-ratio (LHAR) test structures for ALD growth conformality and uniformity evaluation
G. Feng, S. Arpiainen, S. Gorelick, R. L. Puurunen, Baltic ALD 2014 (12th International Baltic Conference on Atomic Layer Deposition), May 12-13, Helsinki, Finland, oral presentation (given by Puurunen).


59. Temperature dependence of the mechanical properties of ALD TiO2 from TiCl4 and H2O on silicon
O. M. E. Ylivaara, X. Liu, L. Kilpi, D. Schneider, M. Laitinen, J. Julin, S. Ali, S. Sintonen, E. Haimi, T. Sajavaara, H. Lipsanen, H. Ronkainen, S.-P. Hannula, R. L. Puurunen, Baltic ALD 2014 (12th International Baltic Conference on Atomic Layer Deposition), May 12-13, Helsinki, Finland, oral presentation (given by Ylivaara).


58. Mechanical properties of ALD TiN films made from TiCl4 and NH3
R. L. Puurunen, O. M. E. Ylivaara, X. Liu, J. Julin, S. Sintonen, B. Marchand, P. Jalkanen, E. Haimi, M. Tuominen, J. Räisänen, T. Sajavaara, H. Lipsanen, S.-P. Hannula, Baltic ALD 2014 (12th International Baltic Conference on Atomic Layer Deposition), May 12-13, Helsinki, Finland, poster presentation.


57. Tribological Performance of ALD Al2O3, TiO2 and ATO nanolaminate coatings
L. Kilpi, A. Vaajoki, S. Varjus, O.M.E. Ylivaara, R. L. Puurunen, H. Ronkainen, Baltic ALD 2014 (12th International Baltic Conference on Atomic Layer Deposition), May 12-13, Helsinki, Finland, poster presentation.


56. Residual Stresses in Atomic Layer Deposited Tantalum Oxide Thin Films
E. Härkönen, O. M. E. Ylivaara, H. Heikkinen, R. L. Puurunen, M. J. Heikkilä, M. Ritala, Baltic ALD 2014 (12th International Baltic Conference on Atomic Layer Deposition), May 12-13, 2014, Helsinki, Finland, poster presentation.


55. Atomic Layer Deposition of Holmium Titanium Oxide Thin Films
K. Kukli, M. Kemell, E. Puukilainen, M. Heikkilä, M. Ritala, M. Leskelä, J. Lu, L. Hultman, J. Link, M.C. Dimri, R. Stern, R. Hoxha & A. Tamm, E-MRS Meeting, Lille France 2014.


54. Electrical Characterization of Holmium Titanium Oxide and Dysprosium-doped Zirconium Oxide Thin Film Grown by Atomic Layer Deposition
H. Castán, H. García, S. Duenas, L. Bailón, E. Miranda, K. Kukli, A. Tamm, J. Aarik, M Ritala & M Leskelä, 18th Workshop on Dielectrics in Microelectronics, Kinsale Cork, Ireland 2014, P15.


53. Nitrogen Induced Modifications of MANOS Memory Properties
N. Nikolaou, V. Ioannou-Sougleridis, P. Dimitrakis, P. Normand, D. Skarlatos, K. Giannakopoulos, S. Ladas, B. Pecassou, G. BenAssayag, K. Kukli, J. Niinistö, M. Ritala & M. Leskelä, Conference on Ion Beam Modification of Materials, Leuven, Belgium 2014.


52. Volatility of Metal Complexes – The Key Property for Application as Precursor for Chemical Thin Film Preparation
M. Leskelä, T. Hatanpää & M. Ritala, 11th European Symposium on Thermal Analysis and Calorimetry, Espoo 2014, Keynote lecture.

51. Recent Developments in ALD Equipment and Processes
M. Ritala, International Conference on Metallurgical Coatings and Thin Films (ICMCTF), April 28 - May 2, 2014, San Diego, Invited talk.


50. Atomic Layer Deposition in Fabrication of Nanostructured Materials for Photocatalysis
M. Leskelä, M. Kemell, V. Pore, E.Santala and Mikko Ritala, ASEAN-EU Science Technology and Innovation Days, 2014, Bangkok, Thailand, Invited talk.


49. Industrial Applications of Atomic Layer Deposition (ALD)
M. Leskelä, J. Niinistö and Mikko Ritala, German MRS Symposium, 2014, Cologne, Germany, Invited talk.


48. Volatile Precursors: Keys for Deposition of Thin Films by Chemical Gas-phase Techniques
M. Leskelä, CELINA COST-action symposium, 2014, Erlangen, Germany, Invited talk.


47. Morphology and Mechanical Properties of ALD Grown BiFeO3 Films
A. Majtyka, D. Chrobak, B. Romanowski, R. Nowak, B. Marchand, J. Räisänen, V. Tuboltsev, P. Jalkanen, M. Puttaswamy, T. Hatanpää, M.Ritala & M. Leskelä, Functional Materials Four Seasons - WINTER, December 11, 2013, Helsinki, Finland, poster.


46. Atomic Layer Deposition - Opportunities and Challenges
M. Ritala, Tyndall Industry Days, 17-19 Sept. 2013, Cork, Ireland, Key Note presentation.


45. Mechanical and Magnetic Properties of ALD Grown BiFeO3 Films
A. Majtyka, D. Chrobak, R. Nowak, B. Marchand, J. Räisänen, V. Tuboltsev, P. Jalkanen, M. Puttaswamy, T. Hatanpää, M.Ritala & M. Leskelä, Programmable Materials (OMA) and Computational Science (Lastu) Joint seminar, September 10-11, 2013, Espoo, Finland, poster.


44. Nanostructured Materials for Energy Applications
Leskelä, M. & Ritala, M., 246th American Chemical Society Fall Meeting, Indianapolis Indiana, USA, September 8-12, 2013, invited talk.


43. Ion Beam Induced Damage in ALD Samples During Heavy Ion Elastic Recoil Detection Analysis
K. Mizohata, J. Keinonen & J. Räisänen, 11th European Conference on Accelerators in Applied Research and Technology, September 8-13, 2013, Namur, Belgium, poster.


42. ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion
Ylivaara, O.M.E., Liu, X., Ali, S., Sintonen S., Laitinen, M., Julin, J., Kilpi, L., Sajavaara, T., Haimi, E., Ronkainen, H., Lipsanen, H., Hannula, S-P. & Puurunen, R.L., EuroCVD 19 (19th European Conference on Chemical Vapor Deposition), Varna, Bulgaria, 1-6th September, 2013, oral presentation.


41. Advantages Using Carbene as a Ligand in Group 11 Precursors for ALD of Copper and Gold
Barry, S.T., Coyle, J.P., Pemle, M., Hagen, D.J., Leskelä, M., Ritala, M & Kariniemi, M., 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, USA, July 28-31, 2013, poster.


40. Novel Guadinate Precursors for ALD of Zirconium Oxide
Blanquart, T., Niinistö, J., Aslam, N., Banerjee, M., Tomczak, Y., Gavagnin, M., Longo, V., Wanzenboeck, H.D., Kessels, W.M.M., Devi, A., Hoffmann-Eifert, S., Ritala, M. & Leskelä, M., 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, USA, July 28-31, 2013, poster.


39. Novel Heteroleptic Precursors for Atomic Layer Deposition of TiO2
Blanquart, T., Niinistö, J., Longo, V., Gavagnin, M., Pallem. V.R., Dussarrant, C., Ritala, M. & Leskelä, M., 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, USA, July 28-31, 2013, poster.


38. Atomic Layer Deposition of Rare Earth Oxides
Niinistö, J., Blanquart, T., Kaipio, M., Seppälä, S., Mizohata, K., Ritala, M., Leskelä, M., ALD 2013 (13th International Conference on Atomic Layer Deposition), San Diego, U.S.A., July 28th-31st, oral presentation.


37. In Situ Reaction Mechanism Studies on the Atomic Layer Deposition Processes of Ti(OiPr)2(NMe)2 and Ti(OiPr-Me-amd) with D2O and Ozone
Tomczak Y., Knapas, K., Leskelä, M. & Ritala, M., ALD 2013 (13th International Conference on Atomic Layer Deposition), San Diego, U.S.A., July 28th-31st, oral presentation.


36. Atomic Layer Deposition of Lithium Fluoride
Mäntymäki M., Hämäläinen J., Ritala M. & Leskelä M., ALD2013: The 13th AVS-ALD 2013 conference, July 28th-31st, 2013, San Diego, USA, poster.


35. Screening of ALD thin films for Cu diffusion barrier applications
R.L. Puurunen, J. Salonen, A. Nurmela, O.M.E. Ylivaara, H. Viljanen, J. Molarius, P. Monnoyer, S. Yliniemi, M. Pudas, T. Lehto, and W.-M Li, ALD 2013, July 28-31st, San Diego, California, poster.


34. XRR characterization of ALD TiO2/Al2O3 nanolaminates with ultra-thin bilayers
S. Sintonen, S. Ali, O.M.E. Ylivaara, R.L. Puurunen, H. Lipsanen, ALD 2013, July 28-31st, San Diego, California, poster.


33. ALD membrane strength measurement with a stylus profilometer
Feng Gao, Riikka Puurunen, Anssi Laukkanen, Lauri Kilpi, Helena Ronkainen, Jyrki Kiihamäki, ALD 2013, July 28-31st, San Diego, California, poster.


32. Al2O3 from Me3Al and H2O by ALD on Si: residual stress, elastic modulus, hardness and adhesion
O.M.E. Ylivaara, X. Liu, L. Kilpi, J. Lyytinen, D. Schneider, M. Laitinen, J. Julin, S. Ali, S. Sintonen, M. Berdova, E. Haimi, T. Sajavaara, H. Ronkainen, H. Lipsanen, J. Koskinen, R. L. Puurunen, ALD 2013, July 28-31st, San Diego, California, poster.


31. Atomic Layer Deposition in preparation of nanostructured materials
Ritala M., 2nd Euro-Mediterranean Conference on Materials and Renewable Energies, June 10-14th, 2013, Istres, France, oral presentation.


30. Importance of Precursor Chemistry in Atomic Layer Deposition
Leskelä, M., Hatanpää, T., Niinistö, J. & Ritala, M., 96th Canadian Chemistry Conference and Exhibition, Quebec City Canada, May 26-31, 2013, invited talk.


29. Atomic Layer Deposition of Ferric Oxide Thin Films from Bis(cyclopentadienyl)iron and (dimethylaminomethyl)ferrocene
Kukli, K., Dimri, M., Stern, R., Ritala, M. & Leskelä, M., E-MRS Spring Meeting 2013, Strasbourg, France, May 27-31, 2013, oral presentation.


28. 6. Aluminum Oxide by Atomic Layer deposition: Formation and Applications
Grigoras K., Aluminas-2013: International conference on high-tech aluminas and unfolding their business prospects, March 7-9th, 2013, Kolkata, India, invited presentation.


27. SILAR-grown Sulfides in Nanotubular TiO2 Structure
Tupala, J., Kemell, M., Lindroos, S., Ritala, M. & Leskelä, M., Next Generation Solar Energy – From Fundamentals to Applications, Erlangen Germany, December 2012, poster.


26. ALD of High-k Oxides and in particular Strontium Titanate
Leskelä, M., Vehkamäki, M. & Ritala, M., BIT's 2nd Annual World Congress of Nano S&T-2012, Qindao China, October 26-29, 2012, invited talk.


25. Extremely Thin Suspended Membranes by Combining Nanoimprinting and Atomic Layer Deposition
Kainlauri M., Arpiainen S., Haatainen T., Puurunen R. L. & Ahopelto J., NNT 2012: Nanoimprint and nanoprint technology, Napa, California, October 24-26, 2012, oral presentation.


24. Atomic Layer Deposition of phase change materials
M. Ritala, European\Phase Change and Ovonics Symposium, July 8-10, 2012 Tampere, Finland, Invited talk.


23. Atomic Layer deposition of Bi2Te3
Sarnet T., Hatanpää T., Puukilainen E., Ritala M., Leskelä M., ALD2012: The 12th AVS-ALD 2012 conference, June 17-20th, 2012, Dresden, Germany, oral presentation.


22. Stress in Atomic Layer Deposited Aluminium Oxide and Titanium Dioxide Thin Films
Ylivaara O. M. E., Puurunen R. L., Laitinen M., Sintonen S., Sajavaara T., Lipsanen H. & Kiihamäki J., ALD2012: The 12th AVS-ALD 2012 conference, June 17-20th, 2012, Dresden, Germany, poster.


21. On the Nanoindentation Characterization of Al2O3 Thin Films Grown on Si-wafer by Atomic Layer Deposition
Liu X. W., Haimi E., Puurunen R. L., Ylivaara O. M. E. & Hannula S.-P., ALD2012: The 12th AVS-ALD 2012 conference, June 17-20th, 2012, Dresden, Germany, poster.


20. Adhesion Performance and Tribological Properties of Atomic Layer Deposited Aluminum Oxide Films
Ronkainen H., Kilpi L., Vaajoki A., Varjus S., Ylivaara O. M. E. & Puurunen R. L., ALD2012: The 12th AVS-ALD 2012 conference, June 17-20th, 2012, Dresden, Germany, poster.


19. Atomic Layer Deposition of Phase Change Materials
Leskelä, M., Sarnet, T., Hatanpää, T., Ritala, M & Raoux, S., 1st International Conference of ALD Applications & 2nd China ALD Conference, Shanghai China, October 14-16, 2012, invited talk.


18. Ion Beam Induced Damage in ALD Samples During Heavy Ion Elastic Recoil Detection Analysis
K. Mizohata, J. Keinonen & J. Räisänen, 17th International Conference on Radiation Effects in Insulators, June 30-July 5, 2013, Helsinki, Finland, poster.


17. Effect of ALD Processing and Top Electrodes on ZrO2 Thin Films Structural and Resistive Switching Characteristics
Kärkkänen, I., Heikkilä, M., Niinistö, J., Ritala, M., Leskelä, M., Hoffmann-Eifert, S. & Waser, R., Nature Conference, Aachen, Germany, June 17-19, 2012, poster.


16. Guadinate-based Group IV Complexes: Potential ALD Precursors
Banerjee, M., Xu, K., Blanquart, T., Tomczak, Y., Ritala, M., Leskelä, M. & Devi, A., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, poster.


15. Atomic Layer Deposition and Characterization of VOx Thin Films
Blanquart, T., Niinistö, J., Longo, V., Pallem, V.R., Dussarrat, C., Ritala, M. & Leskelä, M., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, poster.


14. Novel Heteroleptic Precursors for Atomic Layer Deposition of TiO2
Blanquart, T., Niinistö, J., Longo, V., Pallem, V.R., Dussarrat, C., Ritala, M. & Leskelä, M., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, poster.


13. High-performance Imido-Amido Precursor for Atomic layer Deposition of Ta2O5
Blanquart, T., Longo, V., Niinistö, J., Heikkilä, M., Kukli, K., Ritala, M. & Leskelä, M., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, poster.


12. In situ Reaction Mechanism Studies on ALD of Mixed Silicon Aluminum Oxides from Trimethylaluminum, Hexakis ethylaminodisilane and Water
Tomczak, Y., Knapas, K., Kemell, M., Heikkilä, M., Leskelä, M., Ritala, M., Haukka, S. & Ceccato, M., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, oral presentation.


11. Atomic Layer Deposition of Bismuth Ferrite
Puttaswamy, M., Kukli, K., Dimri, M.C., Vehkamäki, M., Ceccato, M., Kemell, M., Hatanpää, T., Heikkilä, M., Tamm, A., Stern, R., Ritala, M. & Leskelä, M., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, oral presentation.


10. Low Temperature ALD of Noble Metals Using Ozone and Moleculer Hydrogen as Reactants
J. Hämäläinen, E. Puukilainen, T. Sajavaara, M. Ritala & M. Leskelä, 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, oral presentation.


9. Atomic Layer Deposition of High-k Dielectrics for Flash Memories
Nikolau, N., Dimitrakis, P., Normand, P., Ioannou-Sougleridis, V., Ginnakopoulos, K., Mergia, K., Kukli, K., Niinistö, J., Ritala, M. & Leskelä, M., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, poster.


8. Modifying Nanostructured Biological Surface: Tailoring the Superhydrophobic and Photocatalytic Properties of Lotus Leaf/TiO2 Composities
Szilagyi, I.M., Teucher, G., Härkönen, E., Färm, E., Hatanpää, T., Nikitin, T., Khriachtchen, L., Räsänen, M., Ritala, M. & Leskelä, M., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, poster.


7. Efficient SERS Substrates by Combining PEALD Silver with Electrospun Fibers
Santala, E., Kariniemi, M., Hatanpää, T., Niinistö, J., Leskelä, M., Ritala, M., Glembocki, O.J. & Prokes, S.M., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, oral presentation.


6. Novel Ligand System for Group 11 metals: Plasma-Enhanced ALD of Copper and Gold
Barry, S.T., Coyle, J.P., Kariniemi, M., Niinistö, J., Ritala, M. & Leskelä M., 12th International Conference on Atomic Layer Deposition, ALD 2012, Dresden, Germany, June 17-20, 2012, poster.


5. Atomic Layer Deposition of Bismuth Ferrite Thin Films
Puttaswamy, M, Kukli, K., Dimri, M.C., Vehkamäki, M., Kemell, M., Hatanpää, T., Tamm, A., Stern, R., Ritala, M. & Leskelä, M., E-MRS 2012 Spring Meeting, Strasbourg, France, May 14-18, 2012, oral presentation.


4. Nanocluster Deposition on Surfaces
A. Venäläinen, A. Pirojenko, V. Tuboltsev, J. Räisänen & M. Kemell, CoE in ALD, ChemBio, March 20-23, 2013, Helsinki, Finland, poster.


3. Nanocluster Deposition on Surfaces
A. Venäläinen, A. Pirojenko, V. Tuboltsev, J. Räisänen & M. Kemell, Physics Days, March 14-16, 2013, Espoo, Finland, poster.


2. Atomic Layer Deposition of Advanced Thin Films
Leskelä, M. & Ritala, M., ZiNG Solid State Chemistry Conference, Lanzarote Spain, Februaury 23-27, 2012, invited talk.


1. Importance of Precursor Chemistry in Atomic Layer Deposition
Leskelä, M., 36th International Conference on Advanced Ceramics and Composities, Daytona Beach, Florida, USA January 22-27, 2012, invited talk.