Publications by ALD CoE

2017 Papers by ALD CoE in Scientific Journals with Referee Practice


16. Atomic layer deposition – A novel method for the Ultrathin Coating of Minitablets.
J. Hautala, T. Kääriäinen, P. Hoppu, M. Kemell, . Heinämäki, D. Cameron, S. George, A. M. Juppo, International Journal of Pharmaceutics 531 (2017) 47–58.
https://doi.org/10.1016/j.ijpharm.2017.08.010


15. Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices.
J. Kim, T. Iivonen, J. Hämäläinen, M. Kemell, K. Meinander, K. Mizohata, L. Wang, J. Räisänen, R. Beranek, M. Leskelä, and A. Devi, Chem. Mater. 29 (2017) 5796−5805.
https://doi.org/10.1021/acs.chemmater.6b05346


14. Atomic layer deposition of tin oxide thin films from bis[bis(trimethylsilyl)amino]tin(II) with ozone and water.
J. Tupala, M. Kemell, M. Mattinen, K. Meinander, S. Seppälä, T. Hatanpää, J. Räisänen, M. Ritala and M. Leskelä, Journal of Vacuum Science & Technology A 35 (2017) 041506.
https://doi.org/10.1116/1.4984279


13. Surface modification of acetaminophen particles by atomic layer deposition.
T. O. Kääriäinen, M. Kemell, M. Vehkamäki, M.-L. Kääriäinen, A. Correia, H. A. Santos, L. M. Bimbo, J. Hirvonen, P. Hoppu, S. M. George, D. C. Cameron, M. Ritala, M. Leskelä, International Journal of Pharmaceutics 525 (2017) 160–174.
https://doi.org/10.1016/j.ijpharm.2017.04.031


12. Atomic layer deposition and properties of mixed Ta2O5 and ZrO2 films.
K. Kukli, M. Kemell, M. Vehkamäki, M. J. Heikkilä, K. Mizohata, K. Kalam, M. Ritala, M. Leskelä, I. Kundrata, and K. Fröhlich, AIP ADVANCES 7 (2017) 025001.
https://doi.org/10.1063/1.4975928


11. Ternary composite Si/TiN/MnO2 taper nanorod array for on-chip supercapacitor
P. Lu, E. Halvorsen, P. Ohlckers, L. Müller, S. Leopold, M. Hoffmann, K. Grigoras, J. Ahopelto, M. Prunnila, X. Chen, Electrochimica Acta 248 (2017) 397–408.
https://doi.org/10.1016/j.electacta.2017.07.162


10. Studies on Li3AlF6 thin film deposition utilizing conversion reactions of thin films
M. Mäntymäki, K. Mizohata, M. J. Heikkilä, J. Räisänen, M. Ritala, and M. Leskelä, Thin Solid Films 636 (2017) 26-33.
https://doi.org/10.1016/j.tsf.2017.05.026


9. Thermoelectric thermal detectors based on ultra-thin heavily doped single-crystal silicon membranes
A. Varpulaa, A. V. Timofeeva, A. Shchepetov, K. Grigoras, J. Hassel, J. Ahopelto, M. Ylilammi, M. Prunnila, Appl. Phys. Lett. 110 (2017), 262101.
https://doi.org/10.1063/1.4989683


8. Self-assembled three-dimensional inverted photonic crystals on a photonic chip
S. Arpiainen, K. Vynck, J. Dekker, M. Kapulainen, W. Khunsin, T. Aalto, M. Mulot, G. Kocher-Oberlehrer, R. Zentel, C. M. S. Torres, D. Cassagne, J. Ahopelto, Phys. Status Solidi A (2017), 1700039.
https://doi.org/10.1002/pssa.201700039


7. Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
Atosuo, E., Mäntymäki, M., Mizohata, K., Heikkilä, M.J., Räisänen, J., Ritala, M., Leskelä, M, Chemistry of Materials, Volume 29, Issue 3, 14 February 2017, Pages 998-1005.
http://dx.doi.org/10.1021/acs.chemmater.6b03586


6. Influence of ALD temperature on thin film conformality: Investigation with microscopic lateral high-aspect-ratio structures
R. L. Puurunen, F. Gao, Proceedings of the International Baltic Conference on Atomic Layer Deposition, 2-4 Oct 2016, St. Petersburg, Russia. Electronically published in IEEE Xplore.
http://ieeexplore.ieee.org/document/7886526/


5. Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low-Temperature Film Growth
M. Mattinen, T. Hatanpää, T. Sarnet, K. Mizohata, K. Meinander, P. J. King, L. Khriachtchev, J. Räisänen, M. Ritala, M. Leskelä, Advanced Materials Interfaces, Early view (published online 30 March).
http://dx.doi.org/10.1002/admi.201700123


4. Studies on Thermal Atomic Layer Deposition of Silver Thin Films
Maarit Mäkelä, Timo Hatanpää, Kenichiro Mizohata, Kristoffer Meinander, Jaakko Niinistö, Jyrki Räisänen, Mikko Ritala, and Markku Leskelä 2017 In : Chemistry of Materials, Published online ahead of print.
http://dx.doi.org/10.1021/acs.chemmater.6b04029


3. Enhanced process and composition control for atomic layer deposition with lithium trimethylsilanolate
A. Ruud, V. Miikkulainen, K. Mizohata, H. Fjellvåg, O. Nilsen, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35 (2017), 01B133.
https://dx.doi.org/10.1116/1.4972209


2. As2S3 thin films deposited by atomic layer deposition
Elina Färm, Mikko J. Heikkilä, Marko Vehkamäki, Kenichiro Mizohata, Mikko Ritala, Markku Leskelä and Marianna Kemell, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35 (2017), 01B114.
http://dx.doi.org/10.1116/1.4968202


1. Potential gold(I) precursors evaluated for atomic layer deposition
Maarit Mäkelä, Timo Hatanpää, Mikko Ritala, Markku Leskelä, Kenichiro Mizohata, Kristoffer Meinander and Jyrki Räisänen, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35 (2017), 01B112.
http://dx.doi.org/10.1116/1.4968193




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