Publications by ALD CoE

2016 Papers by ALD CoE in Scientific Journals with Referee Practice


23. Development of a Reference Database for Particle-Induced Gamma-ray Emission spectroscopy
P. Dimitriou, H.W. Becker, I. Bogdanovic-Radovic, M. Chiari, A. Goncharov, A.P. Jesus, O. Kakuee, A.Z. Kiss, A. Lagoyannis, J. Räisänen, D. Strivay, A. Zucchiatti 2016 In: Nuclear Instruments and Methods B 371, 33-36.
http://dx.doi.org/10.1016/j.nimb.2015.09.052


22. External Beam IBA Set-Up with large-area thin Si3N4 window
V. Palonen, K. Mizohata, T. Nissinen and J. Räisänen 2016 In: Nuclear Instruments and Methods B 380, 11-14.
http://dx.doi.org/10.1016/j.nimb.2016.04.047


21. Scalable Route to the Fabrication of CH3NH3PbI3 Perovskite Thin Films by Electrodeposition and Vapor Conversion
Georgi Popov, Miika Mattinen, Marianna L. Kemell, Mikko Ritala, and Markku Leskela¨ 2016 In : ACS Omega 1, 1296-1306.
http://dx.doi.org/10.1021/acsomega.6b00351


20. Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors
P. Lu, P. Ohlckers, L. Mueller, S. Leopold, M. Hoffmann, K. Grigoras, J. Ahopelto, M. Prunnila, X. Chen, Electrochem. Communicat. 70, 51-55.
http://dx.doi.org/10.1016/j.elecom.2016.07.002


19. Thermal conductivity of amorphous Al2O3/TiO2 nanolaminates deposited by atomic layer deposition
Saima Ali, Taneli Juntunen, Sakari Sintonen, Oili M. E. Ylivaara, Riikka L Puurunen, Harri Lipsanen, Ilkka Tittonen and Simo-Pekka Hannula 2016 In : Nanotechnology 27, 445704, 8 p.
http://dx.doi.org/10.1088/0957-4484/27/44/445704


18. Quasicubic a-Fe2O3 nanoparticles embedded in TiO2 thin ?lms grown by atomic layer deposition
Aile Tamm, Liis Seinberg, Jekaterina Kozlova, Joosep Link, Piret Pikma, Raivo Stern, Kaupo Kukli 2016 In : Thin Solid Films 612, 445–449.
http://dx.doi.org/10.1016/j.tsf.2016.06.036


17. Alkylsilyl compunds a enablers of Atomic Layer Deposition: Analysis of (Et3Si)3As through the GaAs process
T. Sarnet, T. Hatanpää, T. Laitinen, T. Sajavaara, M. Ritala, M. Leskelä 2016 In: Journal of Materials Chemistry C 4, 449-454.
http://dx.doi.org/10.1039/c5tc03079j


16. The structure and the photocatalytic activity of titania based nanotube and nanofiber coatings
A. Radtke, P. Piszczk, A. Topolski, Z. Lewandowska, E. Talik, I.H. Andersen, L.P. Nielsen, M. Heikkilä, M. Leskelä 2016 In: Applied Surface Science 368, 165-172.
http://dx.doi.org/10.1016/j.apsusc.2016.01.219


15. MANOS performance dependence on ALD Al2O3 oxidation source
N. Nikolau, P. Dimitrakis, P. Normand, K. Kukli, J. Niinistö, K. Mizohata, M. Ritala, M. Leskelä, V. Ioannou-Sougleridis 2016 In: Microelectronic Engineering 159, 127-131.
http://dx.doi.org/10.1016/j.mee.2016.03.021


14. Bismuth iron oxide thin films using Atomic Layer Deposition of alternating bismuth oxide and iron oxide layers
M. Puttaswamy, M. Vehkamäki, K. Kukli, M.C. Dimri, M. Kemell, T. Hatanpää, M. Heikkilä, K. Mizohata, R. Stern, M. Ritala, M. Leskelä 2016 In: Thin Solid Films 611, 78-87.
http://dx.doi.org/10.1016/j.tsf.2016.05.006


13. Atomic Layer Deposition of aluminum oxide on modified steel substrates
K. Kukli, E. Salmi, T. Jogiaas, R. Zabels, M. Schuisky, J. Westlinder, K. Mizohata, M. Ritala, M. Leskelä 2016 In: Surface and Coatings Technolgy 304, 1-8.
http://dx.doi.org/10.1016/j.surfcoat.2016.06.064


12. Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulses
M. Mattinen, J. Hämäläinen, M. Vehkamäki, M.J. Heikkilä, K. Mizohata, P. Jalkanen, J. Räisänen, M. Ritala, M. Leskelä 2016 In: Journal of Physical Chemistry C 120, 15235-15243.
http://dx.doi.org/10.1021/acs.jpcc.6b04461


11. Coating and functionalization of high density ion track structures by Atomic Layer Deposition
L. Mättö, I.M. Szilagyi, M. Laitinen, M. Ritala, M. Leskelä, T. Sajavaara 2016 In: Nuclear Instruments and Methods in Physics Research A 832, 254-258.
http://dx.doi.org/10.1016/j.nima.2016.06.132


10. Heteroleptic cyclopentadienyl-amidinate precursors for ALD of Y, Pr, Gd and Dy oxide thin films
S. Seppälä, J. Niinistö, T. Blanquart, M. Kaipio, K. Mizohata, J. Räisänen, C. Lansalot-Matras, W. Noh, M. Ritala, M. Leskelä 2016 In: Chemistry of Matererials 28, 5440-5449.
http://dx.doi.org/10.1021/acs.chemmater.6b01869


9. Atomic Layer Deposited protective layers
Markku Leskelä, Emma Salmi, Mikko Ritala 2016 In : Materials Science Forum 879, 1086-1092.
http://dx.doi.org/10.4028/www.scientific.net/MSFj.879.1086


8. Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition
Miika Mattinen, Jani Hämäläinen, Feng Gao, Pasi Jalkanen, Kenichiro Mizohata, Jyrki Räisänen, Riikka L. Puurunen, Mikko Ritala, Markku Leskelä 2016 In: Langmuir 32, 10559-10569.
http://dx.doi.org/10.1021/acs.langmuir.6b03007


7. Conformal titanium nitride in a porous silicon matrix: A nanomaterial for in-chip supercapacitors
Kestutis Grigoras, Jari Keskinen, Leif Grönberg, Elina Yli-Rantala, Sampo Laakso, Hannu Välimäki, Pertti Kauranen, Jouni Ahopelto, Mika Prunnila 2016 In : Nano Energy, 26, 340-345.
http://dx.doi.org/10.1016/j.nanoen.2016.04.029


6. Structure-dependent mechanical properties of ALD-grown nanocrystalline BiFeO3 multiferroics
Anna Majtyka, Anna Nowak, Benoît Marchand, Dariusz Chrobak, Mikko Ritala, Jyrki Räisänen and Roman Nowak 2016 In : Journal of Nanomaterials, 5348471, 1-7.
http://dx.doi.org/10.1155/2016/5348471


5. Proton induced gamma-ray production cross sections and thick-target yields for boron, nitrogen and silicon
Benoît Marchand, Kenichiro Mizohata and Jyrki Räisänen 2016 In : Nuclear Instruments and Methods, B 378, 25-30.
http://dx.doi.org/10.1016/j.nimb.2016.04.044


4. Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check
Lanford, W. A., Parenti, M., Nordell, B. J., Paquette, M. M., Caruso, A. N., Mäntymäki, M., Hämäläinen, J., Ritala, M., Klepper, K. B., Miikkulainen, V., Nilsen, O., Tenhaeff, W., Dudney, N., Koh, D., Banerjee, S. K., Mays, E., Bielefeld, J. & King, S. W. 2016 In : Nuclear Instruments and Methods in Physics Research B. 371, p. 211-215. 5 p.
http://dx.doi.org/10.1016/j.nimb.2015.10.052


3. Electric and Magnetic Properties of ALD-Grown BiFeO3 Films
Benoît Marchand, Pasi Jalkanen, Vladimir Tuboltsev, Marko Vehkamäki, Manjunath Puttaswamy, Marianna Kemell, Kenichiro Mizohata, Timo Hatanpää, Alexander Savin, Jyrki Räisänen, Mikko Ritala, and Markku Leskelä 2016 In : J. Phys. Chem. C 120, p. 7313–7322.
http://dx.doi.org/10.1021/acs.jpcc.5b11583


2. Low-temperature atomic layer deposition of copper(II) oxide thin films
Tomi Iivonen, Jani Hämäläinen, Benoît Marchand, Kenichiro Mizohata, Miika Mattinen, Georgi Popov, Jiyeon Kim, Roland A. Fischer, Markku Leskelä, Journal of Vacuum Science & Technology A, volume 34, 2016, 01A109.
http://dx.doi.org/10.1116/1.4933089


1. Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon
Lauri Kilpi, Oili M. E. Ylivaara, Antti Vaajoki, Jari Malm, Sakari Sintonen, Marko Tuominen, Riikka L. Puurunen and Helena Ronkainen, J. Vac. Sci. Technol. A 34, 01A124 (2016).
http://dx.doi.org/10.1116/1.4935959




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