Publications by ALD CoE

2015 Papers by ALD CoE in Scientific Journals with Referee Practice


28. Conduction and stability of holmium titanium oxide thin films grown by Atomic Layer Deposition
H. Castán, H. García, S. Duenas, L. Bailón, E. Miranda, K. Kukli, M. Kemell, M. Ritala, M. Leskelä 2015 In: Thin Solid Films 591, 55-59.
http://dx.doi.org/10.1016/j.tsf.2015.08.027


27. Mechanical properties of tantalum oxide, aluminum oxide, hafnium oxide and zirconium oxide nanolaminates
T. Jogiaas, R. Zabels, A. Tamm, M. Heikkilä, H. Mändar, K. Kukli, M.Ritala, M. Leskelä 2015 In: Surface and Coatings Technology 282, 36-42.
http://dx.doi.org/10.1016/j.surfcoat.2015.10.008


26. Nitrogen induced modifications of MANOS memory properties
N. Nikolau, V. Ioannou-Sougleridis, P. Dimitrakis, P. Normand, D. Skarlatos, K. Giannakopoulos, S. Ladas, B. Pecassou, G. BenAssayag, K. Kukli, J. Niinistö, M. Ritala, M. Leskelä 2015 In: Nuclear Instruments and Methods in Physics Research B 365, 61-65.
http://dx.doi.org/10.1016/j.nimb.2015.04.015


25. High-quality Slot Waveguide Ring Resonator Based on Atomic Layer Deposition
A. Autere, L. Karvonen, A.Säynätjoki, M. Roussey, E. Färm, M. Kemell, X. Tu, T.Y. Liow, G.Q. Lo, M. Ritala, M. Leskelä, S. Honkanen & Z. Sun, Proceedings SPIE 9367, Silicon Photonics X (2015), 93671J, 7pp.
http://dx.doi.org/10.1117/12.2076903


24. MANOS Erase Performance Dependence on Nitrogen Annealing Conditions
V.Ioannou-Sougleridis, N.Nikolaou, P. Dimitrakis, P. Normand, D. Skarlatos, A.Travlos, K. Kukli, J.Niinisto, M. Ritala & M. Leskela, Mater. Res. Soc. Symp. Proc. 1729 (2015) 6pp.
http://dx.doi.org/10.1557/opl.2015.212


23. Resistless fabrication of embedded nanochannels by FIB patterning, wet etching and atomic layer deposition
Han, Z., Vehkamäki, M. J., Leskelä, M. & Ritala, M. K. 2015 In : Proceedings of the 15th IEEE International Conference on Nanotechnology, p. 1008-1011 4 p.
http://dx.doi.org/10.1109/NANO.2015.7388790


22. (Et3Si)2Se as a precursor for atomic layer deposition: growth analysis of thermoelectric Bi2Se3
Tiina Sarnet, Timo Hatanpää, Marko Vehkamäki, Timo Flyktman, Jouni Ahopelto, Kenichiro Mizohata, Mikko Ritala and Markku Leskelä 2015 In : J. Mater. Chem. C, 3, 4820-4828.
http://dx.doi.org/10.1039/C5TC00533G


21. Nanotribological, nanomechanical and interfacial characterization of atomic layer deposited TiO2 on a silicon substrate
Jussi Lyytinen, Xuwen Liu, Oili M.E. Ylivaara, Sakari Sintonen, Ajai Iyer, Saima Ali, Jaakko Julin, Harri Lipsanen, Timo Sajavaara, Riikka L. Puurunen, Jari Koskinen, Wear, Volumes 342–343, 15 November 2015, Pages 270-278, ISSN 0043-1648.
http://dx.doi.org/10.1016/j.wear.2015.09.001


20. Atomic layer deposition and characterization of dysprosium-doped zirconium oxide thin films
Tamm, Aile; Kozlova, Jekaterina; Arroval, Tõnis; Aarik, Lauri; Ritslaid, Peeter; Garcia, Hector; Castán, Helena; Dueñas, Salvador; Kukli, Kaupo; Aarik, Jaan 2015 In : Chemical Vapor Deposition, 21, 181–187.
http://dx.doi.org/10.1002/cvde.201507170


19. Inert ambient annealing effect on MANOS capacitor memory characteristics
Nikolaos Nikolaou, Panagiotis Dimitrakis, Pascal Normand, Dimitrios Skarlatos, Konstantinos Giannakopoulos, Konstantina Mergia, Vassilios Ioannou-Sougleridis, Kaupo Kukli, Jaakko Niinistö, Kenichiro Mizohata, Mikko Ritala, Markku Leskelä 2015 In : Nanotechnology 26, 134004.
http://dx.doi.org/10.1088/0957-4484/26/13/134004


18. Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozone
Kaupo Kukli, Marianna Kemell, Joel Köykkä, Kenichiro Mizohata, Marko Vehkamäki, Mikko Ritala, Markku Leskelä 2015 In : Thin Solid Films 589, 597–604.
http://dx.doi.org/10.1016/j.tsf.2015.06.033


17. Effect of atomic layer deposited aluminium oxide on mechanical properties of porous silicon carbide
Taivo Jõgiaas, Lauri Kollo, Jekaterina Kozlova, Aile Tamm, Irina Hussainova, Kaupo Kukli 2015 In : Ceramics International 41, 7519–7528.
http://dx.doi.org/10.1016/j.ceramint.2015.02.074


16. Impedance spectroscopy study of the unipolar and bipolar resistive switching states of atomic layer deposited polycrystalline ZrO2 thin films
Irina Kärkkänen, Andrey Shkabko, Mikko Heikkilä, Marko Vehkamäki, Jaakko Niinistö, Nabeel Aslam, Paul Meuffels, Mikko Ritala, Markku Leskelä, Rainer Waser, and Susanne Hoffmann-Eifert 2015 In : Phys. Status Solidi A, 212, 4, 751-766.
http://dx.doi.org/10.1002/pssa.201431489


15. Slot waveguide ring resonators coated by an atomic layer deposited organic/inorganic nanolaminate
A. Autere, L. Karvonen, A. Säynätjoki, M. Roussey,2 E. Färm, M. Kemell, X. Tu,4 T.Y. Liow, G.Q. Lo, M. Ritala, M. Leskelä, S. Honkanen, H. Lipsanen, and Z. Sun 2015 In : Opt. Express, 23, 247519.
http://dx.doi.org/10.1364/OE.23.026940


14. High resolution double-sided diffractive optics for hard X-ray microscopy
Istvan Mohacsi, Ismo Vartiainen, Manuel Guizar-Sicairos, Petri Karvinen, Vitaliy A. Guzenko, Elisabeth Müller, Elina Färm, Mikko Ritala, Cameron M. Kewish, Andrea Somogyi and Christian David 2015 In : Opt. Express, 23, 224406.
10.1364/OE.23.000776

13. Selective etching of focused gallium ion beam implanted regions from silicon as a nanofabrication method
Zhongmei Han, Marko Vehkamäki, Miika Mattinen, Emma Salmi, Kenichiro Mizohata, Markku Leskelä and Mikko Ritala 2015 In : Nanotechnology, 26, 265304.
http://dx.doi.org/10.1088/0957-4484/26/26/265304


12. High Aspect-Ratio Iridium-Coated Nanopillars for Highly Reproducible Surface-Enhanced Raman Scattering (SERS)
Guoguo Kang, Antti Matikainen, Petri Stenberg, Elina Fa¨rm, Peng Li, Mikko Ritala, Pasi Vahimaa, Seppo Honkanen, and Xiaodi Tan 2015 In : ACS Appl. Mater. Interfaces, 7, 11452-11459
http://dx.doi.org/10.1021/acsami.5b02206


11. Charge and current hysteresis in dysprosium-doped zirconium oxide thin films
H. Castán, S. Dueñas, H. García, L. Bailón, K. Kukli, A. Tamm, J. Kozlova, J. Aarik, K. Mizohata 2015 In : Microelectronic Engineering 147, 55–58.
http://dx.doi.org/10.1016/j.mee.2015.04.022


10. Electrical characterization of MIS capacitors based on Dy2O3-doped ZrO2 dielectrics
H. García, H. Castán, S. Dueñas, E. Pérez, L. Bailón, A. Tamm, K. Kukli, J. Aarik, K. Mizohata 2015 In : IEEE Conference Publications, 10th Spanish Conference on Electron Devices (CDE), IEEE Catalog Number CFP 155589-ART, ISBN 978-1 -4799-8108-3.


9. Dysprosium oxide and dysprosium-oxide-doped titanium oxide thin films grown by atomic layer deposition
Tamm, A., Kozlova, J., Aarik, L., Aarik, J., Kukli, K., Link, J., Stern, R., 2015 In : Journal of Vacuum Science and Technology A. 33. p. 01A127-1 – 01A127-5.
http://dx.doi.org/10.1116/1.4902079


8. Photocatalytic activity of TiO2 films on Si support prepared by atomic layer deposition
Buchalska, M., Surowka, M., Hämäläinen, J., Iivonen, T., Leskelä, M. & Macyk, W., In : Catalysis Today. 252, p. 14-19. 6 p.
http://dx.doi.org/10.1016/j.cattod.2014.09.032


7. Atomic Layer Deposition and Characterization of Bi2Te3 Thin Films
Sarnet, T., Hatanpää, T., Puukilainen, E., Mattinen, M., Vehkamäki, M., Mizohata, K., Ritala, M., Leskelä, M. 2015 In : J. Phys. Chem. A.
http://dx.doi.org/10.1021/jp5063429


6. Needleless electrospinning with twisted wire spinneret
Holopainen, J., Penttinen, T., Santala, E. & Ritala, M. 2015 In : Nanotechnology. 26, 2.
http://dx.doi.org/10.1088/0957-4484/26/2/025301


5. Atomic Layer Deposition of AlF3 Thin Films Using Halide Precursors
Miia Mäntymäki, Mikko J. Heikkilä, Esa Puukilainen, Kenichiro Mizohata, Benoît Marchand, Jyrki Räisänen, Mikko Ritala, Markku Leskelä 2015 In : Chem. Mater. 27, 604.
http://dx.doi.org/10.1021/cm504238f


4. Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis
F. Gao, S. Arpiainen & R. L. Puurunen 2015 In: J. Vac. Sci. Technol. A 33, 010601.
http://dx.doi.org/10.1116/1.4903941


3. Studies on Atomic Layer Deposition of IRMOF-8 Thin Films
Salmi, L.D., Heikkilä, M.J., Vehkamäki, M., Puukilainen, E., Sajavaara, T.P. & Ritala, M. 2015 In : J. Vac. Sci. Technol. A 33, 01A121-1 - 01A121-8.
http://dx.doi.org/10.1116/1.4901455


2. Fracture properties of atomic layer deposited Al2O3 free-standing membranes
Maria Berdova, Oili M. E. Ylivaara, Ville Rontu, Pekka T. Törmä, Riikka L. Puurunen, Sami Franssila 2015 In : J. Vac. Sci. Technol. A 33, 01A106.
http://dx.doi.org/10.1116/1.4893769


1. Following the dynamics of matter with femtosecond precision using the X-ray streaking method
C. David, P. Karvinen, M. Sikorski, S. Song, I. Vartiainen, C. J. Milne, A. Mozzanica, Y. Kayser1, A. Diaz, I. Mohacsi, G. A. Carini, S. Herrmann2, E. Färm, M. Ritala, D. M. Fritz & A. Robert 2015 In : Nature Scientific Reports, 5, 7644.
http://dx.doi.org/10.1038/srep07644




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