Publications by ALD CoE

2014 Papers by ALD CoE in Scientific Journals with Referee Practice


27. Coated porous Si for high performance on-chip supercapacitors
K. Grigoras, J. Keskinen, L. Grönberg, J. Ahopelto, M. Prunnila, J. Physics: Conference Series 557, 012058.
http://dx.doi.org/10.1088/1742-6596/557/1/012058


26. Heteroleptic Precursors for Atomic Layer Deposition
J. Niinistö, T. Blanquart, S. Seppälä, M. Ritala & M. Leskelä, ECS Transactions 64(9) (2014) 221-232.
http://dx.doi.org/10.1149/06409.0221ecst


25. Resisitve Switching Behavior and Electrical Properties TiO2:Ho2O3 and HoTiOx Based MIM Capacitors
H. García, H. Castán, S. Dueñas, S. Perez, L.A. Bailón, K. Kukli, M. Ritala & M. Leskelä, Mater. Res. Soc. Symp. Proc. 1691 (2014) 598/1-598/6.
http://dx.doi.org/10.1557/opl.2014.598


24. Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
Woochool Jang, Heeyoung Jeon, Chunho Kang, Hyoseok Song, Jingyu Park, Hyunjung Kim, Hyungtak Seo, Markku Leskela, and Hyeongtag Jeon 2014 In : Phys. Status Solidi A, 211, 2166-2171.
http://dx.doi.org/10.1002/pssa.201431162


23. Resistive Switching Behavior and Electrical Properties of TiO2:Ho2O3 and HoTiOx Based MIM Capacitors
H. García, H. Castán, S.Dueñas, E. Pérez, L. A. Bailón, K. Kukli, M. Ritala, M. Leskelä, 2014 In : Materials Research Society Symposium Proceedings 1691.
http://dx.doi.org/10.1557/opl.2014.598


22. Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O
Aarik, L., Alles, H., Aidla, A., Kahro, T., Kukli, K., Niinistö, J., Mändar, H., Tamm, A., Rammula, R., Sammelselg, V., Aarik, V., 2014 In Thin Solid Films. 565, p. 37-44.
http://dx.doi.org/10.1016/j.tsf.2014.06.052


21. Electrospinning of calcium carbonate fibers and their conversion to nanocrystalline hydroxyapatite
Holopainen, J., Santala, E., Heikkilä, M. & Ritala, M. 2014 In : Materials Science & Engineering. C, Biomimetic Materials, Sensors and Systems. 45, 469-476.
http://dx.doi.org/10.1016/j.msec.2014.09.035


20. Modification of Hematite Electronic Properties with Trimethyl Aluminum to Enhance the Efficiency of Photoelectrodes
M. Tallarida, C. Das, K. Kukli, A. Tamm, D. Cibrev, M. Ritala, T. Lana-Villareal, R. Gomez, M. Leskelä, D. Schmeisser 2014 In : J. Phys. Chem. Lett. 5. 3582-3587.
http://dx.doi.org/10.1021/jz501751w


19. Single Parameter Model for the Post-breakdown Conduction Characteristics of HoTiOx Based MIM Capacitors
J. Blasco, H. Castan, H. Garcia, S. Duenas, J. Sune, M. Kemell, K. Kukli, M. Ritala, M. Leskelä, E. Miranda 2014 In : Microel. Reliab. 54. 1701-1711.
http://dx.doi.org/10.1016/j.microrel.2014.07.067


18. Atomic Layer Deposition of TiO2 and ZrO2 Thin Films Using Heteroleptic Guanidinate Precursors
M. Kaipio, T. Blanquart, M. Banerjee, J. Niinistö, V. Longo, K. Mizohata, A. Devi, M. Ritala, M. Leskelä 2014 In : Chem. Vap. Deposition 20. 209-216.
http://dx.doi.org/10.1002/cvde.201407115


17. Interface control of atomic layer deposited oxide coatings by filtered cathodic arc deposited sublayers for improved corrosion protection
Härkönen, E., Tervakangas, S., Kolehmainen, J., Díaz, B., Swiatowska, J., Maurice, V., Seyeux, A., Marcus, P., Fenker, M., Tóth, L., Radnóczi, G. & Ritala, M. 08.07.2014 In : Materials Chemistry and Physics. 147, 3, s. 895-907.
http://dx.doi.org/10.1016/j.matchemphys.2014.06.035


16. Magnetic Properties of Bismuth Ferrite Films Grown by Atomic Layer Deposition
P. Jalkanen, V. Tuboltsev, B. Marchand, A. Savin, M. Puttaswamy, M. Vehkamäki, K. Kukli, K. Mizohata, J. Räisänen, M. C. Dimri, M. Kemell, T. Hatanpää, M. Heikkilä, R. Stern, M. Ritala, and M. Leskelä In : The Journal of Physical Chemistry Letters. 5 (2014) 4319-4323.
http://dx.doi.org/10.1021/jz502285f


15. Preparation and bioactive properties of nanocrystalline hydroxyapatite thin films obtained by conversion of atomic layer deposited calcium carbonate
Holopainen, J., Kauppinen, K., Mizohata, K., Santala, E., Mikkola, E., Heikkilä, M., Kokkonen, H., Leskelä, M., Lehenkari, P., Tuukkanen, J. and Ritala, M. 2014 In: Biointerphases, 9, 031008.
http://dx.doi.org/10.1116/1.4889975


14. Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films
T. Blanquart, M. Kaipio, J. Niinistö, M. Gavagnin, V. Longo, L. Blanquart, C. Lansalot, H.D. Wanzenboeck, M. Ritala, M. Leskelä 2014 In : Chem. Vap. Deposition 20. 217-223.
http://dx.doi.org/10.1002/cvde.201407116


13. Atomic Layer Deposition, Characterization and Growth Mechanistic Studies of TiO2 Thin Films
M. Kaipio, T. Blanquart, Y. Tomczak, J. Niinistö, M. Gavagnin, V. Longo, H.D. Wanzenboeck, V.R. Pallem, C. Dussarrt, E. Puukilainen, M. Ritala & M. Leskelä 2014 In: Langmuir, 30, 7395-7404.
http://dx.doi.org/10.1021/la500893u


12. Holmium and Titanium Oxide Nanolaminates by Atomic Layer Deposition
K. Kukli, J. Lu, J. Link, M. Kemell, E. Puukilainen, R. Hoxha, A. Tamm, L. Hultman, R. Stern, M. Ritala & M. Leskelä 2014 In: Thin Solid Films, 565, 165-171.
http://dx.doi.org/10.1016/j.tsf.2014.06.039


11. Holmium Titanium Oxide Thin Films Grown by Atomic Layer Deposition
K. Kukli, M. Kemell, M.C. Dimri, E. Puukilainen, A. Tamm, R. Stern, M. Ritala & M. Leskelä 2014 In: Thin Solid Films, 565, 261-265.
http://dx.doi.org/10.1016/j.tsf.2014.06.028


10. X-ray Ptychographic Computed Tomography at 16 nm 3D Resolution
Mirko Holler, Ana Diaz, Manuel Guizar-Sicairos, Petri Karvinen, Elina Färm, Mikko Ritala, Andreas Menzel, Jörg Raabe and Oliver Bunk 2014 In: Scientific Reports, 4, Article number: 3857.
http://dx.doi.org/10.1038/srep03857


9. Study of atomic layer deposited ZrO2 and ZrO2/TiO2 films for resistive switching application
Kärkkänen, I., Shkabko, A., Heikkilä, M., Niinistö, J., Ritala, M., Leskelä, M., Hoffmann-Eifert, S. and Waser, R. 2014 In: . Phys. Status Solidi A, 211, p. 301-309.
http://dx.doi.org/10.1002/pssa.201330034


8. Voltage-Dependent Properties of Titanium Dioxide Nanotubes Anodized in Solutions Containing EDTA
Tupala, J., Kemell, M., Hyvönen, H., Ritala, M. & Leskelä, M. 2014 In: Journal of Electrochemical Society. 161, p. E61-65.
http://dx.doi.org/10.1149/2.039404jes


7. Combining focused ion beam and atomic layer deposition in nanostructure fabrication
Han, Z., Vehkamäki, M., Leskelä, M. & Ritala, M. 2014 In: Nanotechnology. 25, p. 115302. 5 p.
http://dx.doi.org/10.1088/0957-4484/25/11/115302


6. Sealing of Hard CrN and DLC Coatings with Atomic Layer Deposition
Härkönen, E., Kolev, I., Díaz, B., Swiatowska, J., Maurice, V., Seyeux, A., Marcus, P., Fenker, M., Toth, L., Radnoczi, G., Vehkamäki, M. & Ritala, M. 2014 In : ACS Applied Materials & Interfaces. 6, p. 1893-1901.
http://pubs.acs.org/doi/abs/10.1021/am404906x


5. XRR characterization of ALD Al2O3/TiO2 nanolaminates with ultra-thin bilayers
Sintonen, S., Ali, S., Ylivaara, O., Puurunen, R. & Lipsanen, H. 2014 In : J. Vac. Sci. Technol. A. 32, p. 01A111.
http://dx.doi.org/10.1116/1.4833556


4. On the Reliability of Nanoindentation Hardness of Al2O3 Films Grown on Si-wafer by Atomic Layer Deposition
Liu, X.W., Haimi, E., Hannula, S.-P., Ylivaara, O.M.E. & Puurunen, R.L. 2014 In : J. Vac. Sci. Technol. A. 32, p. 01A116.
http://dx.doi.org/10.1116/1.4842655


3. Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Ylivaara, O.M.E, Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula & S.-P., Puurunen, R.L. 2014 In : Thin Solid Films. 552, p. 124–135.
http://dx.doi.org/10.1016/j.tsf.2013.11.112


2. In situ reaction mechanism studies on the Ti(NMe2)2(OiPr)2-D2O and Ti(OiPr)3(NiPr-Me-amd)-D2O Atomic Layer Deposition processes
Tomczak, Y., Knapas, K., Ritala, M. & Leskelä, M. 2014 In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 32(1), p. 01A121-01A121-7. 7 p.
http://dx.doi.org/10.1116/1.4843496


1. Corrosion properties of steel protected by nanometre-thick oxide coatings
Belén Díaz, Emma Härkönen, Jolanta Swiatowska, Antoine Seyeux, Vincent Maurice, Mikko Ritala, Philippe Marcus 2014 In : Corrosion Science, 82, 208–217.
http://dx.doi.org/10.1016/j.corsci.2014.01.024




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