Publications by ALD CoE

2013 Papers by ALD CoE in Scientific Journals with Referee Practice


17. Studies on atomic layer deposition of MOF-5 thin films
Salmi, L.D., Heikkilä, M.J., Puukilainen, E., Sajavaara, T., Grosso, D. & Ritala, M., 27.08.2013 In : Microporous and Mesoporous Materials. 182, p. 147-154. 8 p.
http://dx.doi.org/10.1016/j.micromeso.2013.08.024


16. Hydrogen-argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel
Härkönen, E., Potts, S. E., Kessels, W. M. M., Diaz, B., Seyeux, A., Swiatowska, J., Maurice, V., Marcus, P., Radnoczi, G., Toth, L., Kariniemi, M., Niinistö, J. & Ritala, M., 01.05.2013 In : Thin Solid Films. 534, p. 384-393. 10 p.
http://dx.doi.org/10.1016/j.tsf.2013.03.022


15. Tantalum Oxide Nanocoatings Prepared by Atomic Layer and Filtered Cathodic Arc Deposition for Corrosion Protection of Steel: Comparative Surface and Electrochemical Analysis
Díaz, B., Swiatowska, J., Maurice, V., Seyeux, A., Härkönen, E., Ritala, M., Tervakangas, S., Kolehmainen, J. & Marcus, P., 2013 In : Electrochimica Acta 90, p. 232-245.
http://dx.doi.org/10.1016/j.electacta.2012.12.007


14. Stopping Cross Sections of Atomic Layer Deposited Al2O3 and Ta2O5 and of Si3N4 for 12C, 16O, 35Cl, 79Br and 127I Ions
Mizohata, K., Räisänen, J., Keinonen, J., Härkönen, E., Palmans, J. & Ritala, M., 2013 In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, In press.
http://dx.doi.org/10.1016/j.nimb.2013.02.010


13. Zr(NEtMe)2(guan-Net(Me2)2) Precursor as a Novel ALD Precursor: ZrO2 Film Growth and Mechanistic Studies
Blanquart, T., Niinistö, J., Aslam, N., Banerjee, M., Tomczak, Y., Gavagnin, M., Longo, V., Puukilainen, E., Wanzenboeck, H.D., Kessels, W.H.H., Devi, S., Hoffmann-Eifert, S., Ritala, M. & Leskelä. M. 2013 In: Chemistry of Materials. 25, p. 3088-3095. 8p.
http://dx.doi.org/10.1021/cm401279v


12. In situ Reaction Mechanism Studies on Lithium Hexamethyldisilazane and Ozone Atomic Layer Deposition Process for Lithium Silicate
Tomczak, Y., Knapas, K., Sundberg, M.R., Leskelä, M. & Ritala, M. 2013 In: Journal of Physical Chemistry C. 117, p. 14241-14246. 6p.


11. Programming Nanostructured Soft Biological Surfaces by Atomic Layer Deposition
Szilagyi, I.M., Teucher, G., Härkönen, E., Färm, E., Hatanpää, T., Nikitin, T., Khriachtchev, L., Räsänen, M., Ritala, M. & Leskelä, M. 2013 In: Nanotechnology. 24, p. 24701. 6p.
http://dx.doi.org/10.1088/0957-4484/24/24/245701


10. Deposition of Copper by Plasma-Enhanced Atomic Layer Deposition Using a Novel N-Heterocyclic Carbene Precursor
Coyle, J.P., Dey, G., Yap, G.P.A., Ritala, M., Leskelä, M., Elliott, S.D. & Barry, S.T. 2013 In: Chemistry of Materials. 25, p. 1132-1138. 7p.
http://dx.doi.org/10.1021/cm400215q


9. Influence of Growth and Annealing Temperatures on the Electrical Properties of Nb2O5-based MIM Capacitors
Garcia, H., Castan, H., Perez, E., Duenas, S., Bailon, L., Blaunquart, T., Niinistö, J., Kukli, K., Kariniemi, M., Ritala, M. & Leskelä, M. 2013. In: Semiconductor Science and Technology. 28, p. 055005. 5p.
http://dx.doi.org/10.1088/0268-1242/28/5/055005


8. Photocatalytic Properties of WO3/TiO2 Core-shell Nanofibers by Electrospinning and Atomic Layer Deposition
Szilagyi, I.M., Santala, E., Heikkilä, M., Pore, V., Kemell, M., Nikitin, T., Teucher, G., Firkala, T., Khriachtchev, L., Räsänen, M., Ritala, M. & Leskelä, M. 2103. In: Chemical Vapor Deposition. 19, p. 149-155. 7p.
http://dx.doi.org/10.1002/cvde.201207037


7. The Effect of Oxygen Source in Atomic Layer Deposited Al2O3 as Blocking Oxide in Metal/Aluminum Oxide/Nitride/Oxide/Silicon Memory Capacitors
Nikolau, N., Ioannou-Sougleridis, V., Dimitrakis, P., Normand, P., Skarlatos, D., Giannakopoulos, K., Kukli, K., Niinistö, J., Ritala, M. & Leskelä, M. 2013 In: Thin Solid Films. 533, p. 5-8. 4p.
http://dx.doi.org/10.1016/j.tsf.2012.10.137


6. Structural and Magnetic Studies on Iron Oxide and Iron-Magnesiun Oxide Thin Films Deposited Using Ferrocene and (Dimethylaminomethyl)ferrocene Precursors
Kukli, K., Dimri, M.C., Tamm, A., Kemell, M., Käämbre, T., Vehkamäki, M., Puttaswamy, M., Stern, R., Kuusik, I., Kikas, A., Tallarida, M., Schmeisser, D., Ritala, M. & Leskelä, M. 2013 In: ECS Journal of Solid State Science and Technology. 2, p. N45-N54. 10p.
http://dx.doi.org/10.1149/2.004303jss


5. Atomic Layer Deposition and Characterization of Vanadium Oxide Thin Films
Blanquart, T., Niinistö, J., Gavagin, M., Longo, V., Heikkilä, M., Puukilainen, E., Pallem, V.R., Dussarant, C., Ritala, M. & Leskelä, M 2013 In: RSC Advances. 3, p. 1179-1185. 7p.
http://dx.doi.org/10.1039/c2ra22820c


4. AlxTayOz Mixture Coatings Prepared Using Atomic Layer Deposition for Corrosion Protection of Steel
Härkönen, E., Díaz, B., Swiatowska, J., Maurice, V., Seyeux, A., Fenker, M., Tóth, L., Radnóczi, G., Marcus, P., Ritala, M. 2013 In Chemical Vapor Deposition. 19, p. 194-203, 10 p.
http://dx.doi.org/10.1002/cvde.201207028


3. Atomic Layer Deposition of LiF Thin Films from Lithd and TiF4 Precursors
Mäntymäki, M., Hämäläinen, J., Puukilainen, E., Munnik, F., Ritala, M. & Leskelä, M. 2013 In : Chemical Vapor Deposition. 19, 4-6, p. 111–116. 6 p.
http://dx.doi.org/10.1002/cvde.201207026


2. Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd)2, and TiF4 Precursors
Mäntymäki, M., Hämäläinen, J., Puukilainen, E., Sajavaara, T., Ritala, M. & Leskelä, M. 2013 In : Chemistry of Materials. 25, 9, p. 1656–1663. 8 p.
http://dx.doi.org/10.1021/cm400046w


1. Low Temperature Atomic Layer Deposition of Noble Metals Using Ozone and Molecular Hydrogen as Reactants
Hämäläinen, J., Puukilainen, E., Sajavaara, T., Ritala, M. & Leskelä, M. 2013 In : Thin Solid Films. 531, p. 243-250. 8 p.
http://dx.doi.org/10.1016/j.tsf.2013.01.091




Go to the 2018 publications

Go to the 2017 publications

Go to the 2016 publications

Go to the 2015 publications

Go to the 2014 publications

Go to the 2012 publications