Publications by ALD CoE

2012 Papers by ALD CoE in Scientific Journals with Referee Practice


22. Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition
Puurunen, R. L. , Häärä, A. , Saloniemi, H. , Dekker, J. , Kainlauri, M. , Pohjonen, H. , Suni, T. , Kiihamäki, J. , Santala, E. , Leskelä, M. & Kattelus, H. 2012 In : Sensors and Actuators A: Physical. 188, p. 240-245. 6 p.
http://dx.doi.org/10.1016/j.sna.2012.01.040


21. Atomic layer deposition of ferromagnetic iron oxide films on three-dimensional substrates with tin oxide nanoparticles
Tamm, A. , Dimri, M. C. , Kozlova, J. , Aidla, A. , Tätte, T. , Arroval, T. , Mäeorg, U. , Mändar, H. , Stern, R. & Kukli, K. 2012 In : Journal of Crystal Growth. 343, 1, p. 21-27. 7 p. http://dx.doi.org/10.1016/j.jcrysgro.2011.09.062


20. Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films
Puurunen, R., Suni, T., Ylivaara, O., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H. In : Sensors and Actuators A 188 (2012) 268 - 276.
http://dx.doi.org/10.1016/j.sna.2012.05.006


19. In situ Reaction Mechanism Studies on Atomic Layer Deposition of AlxSiyOz from Trimethylaluminium, Hexakis(ethylamino)disilane and Water
Tomczak Y., Knapas K., Haukka S., Kemell M., Heikkilä M., Ceccato M., Leskelä M. & Ritala M. In : Chem. Mater. 24 (2012) 3859-3867.
http://dx.doi.org/10.1021/cm301658m


18. Novel Heteroleptic Precursors for Atomic Layer Deposition of TiO2
Blanquart T., Niinistö J., Longo V., Pallem V. R., Dussarrat C., Ritala M. & Leskelä M. In : Mater. Chem. 24 (2012) 3420-3424.
http://dx.doi.org/10.1021/cm301594p


17. Cycloheptatrienyl-based Heteroleptic Precursors for Atomic Layer Deposition of Group 4 Oxide Films
Niinistö J., Hatanpää T., Mäntymäki M., Kariniemi M., Costelle L., Mizohata K., Kukli K., Ritala M. & Leskelä M. In : Chem. Mater. 24 (2012) 2002-2008.
http://dx.doi.org/10.1021/cm2030735


16. Atomic Layer Deposited Iridium Oxide Thin Film as Microelectrode Coating in Stem Cell Applications
Ryynänen, T., Ylä-Outinen, L., Narkilahti, S., Tanskanen, J. M. A., Hyttinen, J., Hämäläinen, J., Leskelä, M. & Lekkala, J. 2012 In : Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films. 30, 4, p. 041501. 5 p.
http://dx.doi.org/10.1116/1.4709447


15. Optical and Dielectric Characterization of Atomic Layer Deposited Nb2O5 Thin Films
Blanquart T., Kukli K., Niinistö J., Longo V., Heikkilä M., Ritala M. & Leskelä M. In : ECS Solid State Lett. 1 (2012) N1-N3.
http://dx.doi.org/10.1149/2.002201ssl


14. Passivation of Copper Surfaces for Selective-Area ALD Using Thiol Self-Assembled Monolayers
Färm E., Vehkamäki M., Ritala M. & Leskelä M. In : Semicond. Sci. Technol. 27 (2012) 074004.
http://dx.doi.org/10.1088/0268-1242/27/7/074004


13. Preparation of Regularly Structured Nanotubular TiO2 Thin Films on ITO and Their Modification with Thin ALD-Grown Layers
Tupala J., Kemell M., Härkönen E., Ritala M. & Leskelä M. In : Nanotechnology 23 (2012) 125707/1-7.
http://dx.doi.org/10.1088/0957-4484/23/12/125707


12. Evaluation and Comparison of Novel Precursors for Atomic Layer Deposition of Nb2O5 Thin Films
Blanquart T., Niinistö J., Heikkilä M., Sajavaara T., Kukli K., Puukilainen E., Xu C., Hunks W., Ritala M. & Leskelä M. In : Chem. Mater. 24 (2012) 975-980.
http://dx.doi.org/10.1021/cm2026812


11. Atomic Layer Deposition of Ru Films from Bis(2,5-dimethylpyrrolyl)ruthenium and Oxygen
Kukli K., Aarik J., Aidla A., Jogi I., Arroval T., Lu J., Laitinen M., Sajavaara T., Kiisler A.-A., Ritala M., Leskelä M., Peck J., Natwora J., Geary J., Spohn R., Meiere S. & Thompson D. M. In : Thin Solid Films 520 (2012) 2756-2763.
http://dx.doi.org/10.1016/j.tsf.2011.11.088


10. Influence of Atomic Layer Deposition Chemistry of High-k Dielectrics for Charge Trapping Memories
Nikolaou N., Dimitrakis P., Normand P., Ioannou-Sougleridis V., Giannakopoulos K., Mergia K., Kukli K., Niinistö J., Ritala M. & Leskelä M. In : Solid State Electron. 68 (2012) 38-47.
http://dx.doi.org/10.1016/j.sse.2011.09.016


9. Study of amorphous lithium silicate thin films grown by atomic layer deposition
Hämäläinen, J., Munnik, F., Hatanpää, T., Holopainen, J., Ritala, M. & Leskelä, M. 2012 In : Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films. 30, 1, p. 01A106. 5 p.
http://dx.doi.org/10.1116/1.3643349


8. Microcontact Printed RuOx Film as an Activation Layer for Selective-Area Atomic Layer Deposition of Ruthenium
Färm, E., Lindroos, S., Ritala, M. & Leskelä, M. 2012 In : Chemistry of Materials. 24, 2, p. 275-278. 4 p.
http://dx.doi.org/10.1021/cm202468s


7. Lithium Phosphate Thin Films Grown by Atomic Layer Deposition
Hämäläinen, J., Holopainen, J., Munnik, F., Hatanpää, T., Heikkilä, M., Ritala, M. & Leskelä, M. 2012 In : Journal of the Electrochemical Society. 159, 3, p. A259-A263. 5 p.
http://dx.doi.org/10.1149/2.052203jes


6. In Situ Reaction Mechanism Studies on the New (BuN)-Bu-t=M(NEt2)(3) -Water and (BuN)-Bu-t=M(NEt2)(3) - Ozone (M = Nb,Ta) Atomic Layer Deposition Processes
Tomczak, Y., Knapas, K., Sundberg, M., Leskelä, M. & Ritala, M. 2012 In : Chemistry of Materials. 24, 9, p. 1555-1561. 7 p.
http://dx.doi.org/10.1021/cm202933g


5. High-performance imido-amido precursor for the atomic layer deposition of Ta2O5
Blanquart, T., Longo, V., Niinistö, J., Heikkilä, M., Kukli, K., Ritala, M. & Leskelä, M. 2012 In : Semiconductor Science and Technology. 27, 7, p. -. 6 p.
http://dx.doi.org/10.1088/0268-1242/27/7/074003


4. Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
Kariniemi, M., Niinistö, J., Vehkamäki, M., Kemell, M., Ritala, M., Leskelä, M. & Putkonen, M. 2012 In : Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films. 30, 1, p. 01A115. 5 p.
http://dx.doi.org/10.1116/1.3659699


3. Atomic Layer Deposition of Osmium
Hämäläinen, J., Sajavaara, T., Puukilainen, E., Ritala, M. & Leskelä, M. 2012 In : Chemistry of Materials. 24, 1, p. 55-60. 6 p.
http://dx.doi.org/10.1021/cm201795s


2. Atomic Layer Deposition of Aluminum and Titanium Phosphates
Hämäläinen, J., Holopainen, J., Munnik, F., Heikkilä, M., Ritala, M. & Leskelä, M. 2012 In : Journal of Physical Chemistry C. 116, 9, p. 5920-5925. 6 p.
http://dx.doi.org/10.1021/jp205222g


1. Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
Prokes, S. M., Glembocki, O. J., Cleveland, E., Caldwell, J. D., Foos, E., Niinistö, J. & Ritala, M. 30.01.2012 In : Applied Physics Letters. 100, 5, p. 053106. 3 p.
http://dx.doi.org/10.1063/1.3679106




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