Contact Information

Material Physics Division
Department of Physics
P.O. Box 43 (Pietari Kalmin katu 2)
FI-00014 University of Helsinki, Finland

Jyrki Räisänen
Tel. +358 50 4156814

Accelerator Laboratory

The main task of Materials PHysics Division (MP) within the collaboration is to carry out characterisation of materials and structures manufactured employing ALD. MP will also improve and develop ion beam based methods utilized in the characterisation of the ALD grown structures, e.g. sensitivity and depth resolution. The equipment installed at MP provides versatile and complementary tools for development of new materials and ion implantation, irradiation and characterization of the materials produced by the partners of the CoE. The cluster beam deposition facility will be employed for thin film manufacturing and ion beam etching for surface nanostructuring and downsizing. The accelerator facilities used for materials characterisation and modification and thin film production consist of a 5 MV tandem accelerator with five beam lines, a 500 kV accelerator with two beam lines, a 30 kV accelerator, and a 10 kV ion gun. In MP the following techniques are available for characterisation and analysis: ERD, RBS, NRB, NRA, DSA, PIGE and AMS (Accelerator Mass Spectrometry). Ultra high vacuum AFM/STM, AES and LEED are available for in-situ surface analysis. For larger surface areas a 3D profilometer can be employed. A variable temperature (10 mK -> RT) electrical characterization system has recently been installed in a shielded room. Dedicated computer resources are available for computer simulations and data analysis. Atom-level computer simulations complete the experimental work and provide a fundamental understanding of the interaction between ions and matter, and thus aid the development of new materials.