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40 Years of ALD in Finland

40 years ago, Dr. Tuomo Suntola and his group demonstrated the growth of ZnS thin films in alternating, saturating gas-solid reactions. This initiated the development of Atomic Layer Deposition (ALD) in Finland and gradually led to industrial and academic activities worldwide. The famous patent on Atomic Layer Epitaxy (FIN 52359) was filed on November 29, 1974.

Celebrating the round years, the Finnish Centre of Excellence in Atomic Layer Deposition has organized an exhibition: "40 Years of ALD in Finland: Photos, Stories". Initially, the exhibition was presented in the international Baltic ALD conference, May 12-13, 2014, Helsinki ( The exhibition has also visited ALD 2014 conference in Kyoto, Japan ( Here you will find the exhibition in electronic form (PDF):

40 Years of ALD in Finland: Photos, Stories