CoE in ALD
 
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Contact Information


Dr. Ville Miikkulainen
name.surname@helsinki.fi


Prof. Markku Leskelä
Tel. +358 9 191 50195





















































































Program

5th Annual seminar of ALD Centre of Excellence, Helsinki Fair Centre, Lecture hall 3d
March 30, 2017


Program

9.30-9.45 Opening, prof. Markku Leskelä, University of Helsinki
9.45-10.20 Prof. Charles H. Winter, Wayne State University, Detroit, USA
Selective, Low Temperature Atomic Layer Deposition of Cobalt Metal Films 10.20-10.50 FM Mari Napari, University of Jyväskylä
Plasma mode transition effects on PEALD with capacitive and inductive discharges

10.50-11.20 Coffee & Posters

11.20-11.45 Prof. Mikko Ritala, University of Helsinki
ALD of noble metals and their compounds
11.45-12.10 FT Pasi Jalkanen, University of Helsinki
Characterization of multiferroic films

12.10-13.15 Lunch

13.15-13.45 FT Johnny Dahl, University of Turku
Passivation of III-V semiconductor surfaces by combining vacuum-based oxidation and ALD
13.45-14.15 DI Tom Blomberg, ASM Microchemistry Oy
Atomic layer deposition of solid solutions and nanocomposites

14.15-14.40 Coffee & Posters

14.40-15.05 TkT Markku Ylilammi, VTT
Modelling of conformality in lateral high aspect ratio structures
15.05-15.30 FM Miia Mäntymäki, University of Helsinki
Lithium containing transition metal oxides by solid state reaction of ALD thin films
15.30-15.40 Concluding remarks, prof. Mikko Ritala, University of Helsinki


Posters

Riikka Puurunen, VTT: Microscopic all-silicon test structures for thin film conformality analysis

Riikka Puurunen, VTT: On the early history of atomic layer deposition: most significant works and applications

Heta Nieminen, University of Helsinki: Effect of precursor chemistry on residual stress of ALD Al2O3 and TiO2 films

Kristoffer Meinander, University of Helsinki: Characterization of thin films by complementary IBA and XPS measurements

Jere Tupala: Atomic layer deposition of tin oxide thin films from bis[bis(trimethylsilyl)amino]tin(II) with ozone and water

Kalle Niiranen, Beneq: ALD based 3D NIR filter and refractive index control

Kestutis Grigoras: Atomic layer deposition and characterization of TiN layers